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Title: Time resolved x-ray diffraction study of laser annealing in silicon at grazing incidence.

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.344109· OSTI ID:15003321

No abstract prepared.

Research Organization:
Advanced Photon Source, Argonne National Lab., IL (US); Purdue Univ.; Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Cornell Univ. (US)
Sponsoring Organization:
US Department of Energy (US)
OSTI ID:
15003321
Journal Information:
Journal of Applied Physics, Vol. 66, Issue 8; Other Information: PBD: 15 Oct 1989; Related Information: Oct. 15, 1989; ISSN 0021-8979
Country of Publication:
United States
Language:
English