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Title: X-ray scattering from polymer films.

Abstract

No abstract prepared.

Authors:
; ; ; ; ; ; ;
Publication Date:
Research Org.:
Advanced Photon Source, Argonne National Lab., IL (US); Univ. Kiel; State Univ. of New York (US)
Sponsoring Org.:
US Department of Energy (US)
OSTI Identifier:
15002825
DOE Contract Number:  
W-31-109-ENG-38
Resource Type:
Journal Article
Journal Name:
Physica B. Condensed Matter
Additional Journal Information:
Journal Volume: 283; Journal Issue: 1-2; Other Information: PBD: Jun 2000; Related Information: Jun. 2000
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; POLYMERS; X-RAY DIFFRACTION; FILMS; ADVANCED PHOTON SOURCE

Citation Formats

Tolan, M., Seeck, O. H., Wang, J., Sinha, S. K., Rafailovich, M. H., Sokolov, J., APS-USR, and XFD. X-ray scattering from polymer films.. United States: N. p., 2000. Web. doi:10.1016/S0921-4526(99)01884-0.
Tolan, M., Seeck, O. H., Wang, J., Sinha, S. K., Rafailovich, M. H., Sokolov, J., APS-USR, & XFD. X-ray scattering from polymer films.. United States. doi:10.1016/S0921-4526(99)01884-0.
Tolan, M., Seeck, O. H., Wang, J., Sinha, S. K., Rafailovich, M. H., Sokolov, J., APS-USR, and XFD. Thu . "X-ray scattering from polymer films.". United States. doi:10.1016/S0921-4526(99)01884-0.
@article{osti_15002825,
title = {X-ray scattering from polymer films.},
author = {Tolan, M. and Seeck, O. H. and Wang, J. and Sinha, S. K. and Rafailovich, M. H. and Sokolov, J. and APS-USR and XFD},
abstractNote = {No abstract prepared.},
doi = {10.1016/S0921-4526(99)01884-0},
journal = {Physica B. Condensed Matter},
number = 1-2,
volume = 283,
place = {United States},
year = {2000},
month = {6}
}