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Title: Connecting disorder and magnetic properties in CoFe thin films.

Abstract

No abstract prepared.

Authors:
; ; ;
Publication Date:
Research Org.:
Advanced Photon Source, Argonne National Lab., IL (US)
Sponsoring Org.:
US Department of Energy (US)
OSTI Identifier:
15002801
DOE Contract Number:  
W-31-109-ENG-38
Resource Type:
Journal Article
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 76; Journal Issue: 18; Other Information: PBD: 1 May 2000; Related Information: May 1, 2000
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; MAGNETIC PROPERTIES; THIN FILMS; ORDER PARAMETERS; COBALT ALLOYS; IRON ALLOYS; ADVANCED PHOTON SOURCE

Citation Formats

Freeland, J. W., Bussmann, K., Idzerda, Y. U., and XFD. Connecting disorder and magnetic properties in CoFe thin films.. United States: N. p., 2000. Web. doi:10.1063/1.126422.
Freeland, J. W., Bussmann, K., Idzerda, Y. U., & XFD. Connecting disorder and magnetic properties in CoFe thin films.. United States. doi:10.1063/1.126422.
Freeland, J. W., Bussmann, K., Idzerda, Y. U., and XFD. Mon . "Connecting disorder and magnetic properties in CoFe thin films.". United States. doi:10.1063/1.126422.
@article{osti_15002801,
title = {Connecting disorder and magnetic properties in CoFe thin films.},
author = {Freeland, J. W. and Bussmann, K. and Idzerda, Y. U. and XFD},
abstractNote = {No abstract prepared.},
doi = {10.1063/1.126422},
journal = {Applied Physics Letters},
number = 18,
volume = 76,
place = {United States},
year = {2000},
month = {5}
}