Skip to main content
OSTI.GOVU.S. Department of Energy Office of Scientific and Technical Information
U.S. Department of Energy
Office of Scientific and Technical Information
 

Formation of superhydrophobic surfaces

Patent ·
OSTI ID:1500088
; ; ;
Technologies are described for methods and systems effective for etching nanostructures in a substrate. The methods may comprise depositing a patterned block copolymer on the substrate. The methods may comprise applying a precursor to the patterned block copolymer to generate an infiltrated block copolymer. The precursor may infiltrate into the first polymer block domain and generate a material. The methods may comprise applying a removal agent effective to remove the polymer block domains to the infiltrated block copolymer to generate a pattern of the material. The methods may comprise etching the substrate. The pattern of the material may mask the substrate to pattern the etching. The etching may be performed under conditions to produce nanostructures in the substrate. The methods may comprise removing the pattern of the material and coating the nanostructures and the surface of the substrate with a hydrophobic coating.
Research Organization:
Brookhaven National Laboratory (BNL), Upton, NY (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC02-98CH10886
Assignee:
Brookhaven Science Associates, LLC (Upton, NY)
Patent Number(s):
10,189,704
Application Number:
14/897,441
OSTI ID:
1500088
Country of Publication:
United States
Language:
English

References (11)

Fabrication of Broadband Antireflective Plasmonic Gold Nanocone Arrays on Flexible Polymer Films journal November 2013
Anti-reflective coatings: A critical, in-depth review journal January 2011
High energy electron fluxes in dc-augmented capacitively coupled plasmas. II. Effects on twisting in high aspect ratio etching of dielectrics journal January 2010
Enhanced Block Copolymer Lithography Using Sequential Infiltration Synthesis journal July 2011
Ultimate Top-down Etching Processes for Future Nanoscale Devices: Advanced Neutral-Beam Etching journal April 2006
Effect of Cl 2 - and HBr-based inductively coupled plasma etching on InP surface composition analyzed using in situ x-ray photoelectron spectroscopy
  • Bouchoule, S.; Vallier, L.; Patriarche, G.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 30, Issue 3 https://doi.org/10.1116/1.3692751
journal May 2012
Superhydrophobic Transparent Surface of Nanostructured Poly(Methyl Methacrylate) Enhanced by a Hydrolysis Reaction journal April 2013
Fabrication of Size-Tunable Large-Area Periodic Silicon Nanopillar Arrays with Sub-10-nm Resolution journal September 2003
Superhydrophobicity and Superhydrophilicity of Regular Nanopatterns journal October 2005
Block Copolymer Lithography: Periodic Arrays of 1011 Holes in 1 Square Centimeter journal May 1997
A Route to Nanoscopic Materials via Sequential Infiltration Synthesis on Block Copolymer Templates journal May 2011

Similar Records

Formation of antireflective surfaces
Patent · 2019 · OSTI ID:1568340
Formation of antireflective surfaces
Patent · 2021 · OSTI ID:1805346
Formation of antireflective surfaces
Patent · 2022 · OSTI ID:1924907

Related Subjects