skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Thin film confinement reduces compatibility in symmetric ternary block copolymer/homopolymer blends

Abstract

Here, the thin film phase behavior of ternary blends consisting of symmetric poly(styrene) (PS)– b–poly(dimethylsiloxane)(PDMS), PS, and PDMS was investigated using X–ray reflectivity (XRR) and atomic force microscopy (AFM). This system is strongly segregated, and the homopolymers are approximately the same length as the corresponding blocks of the copolymer. The XRR and AFM data are used to quantify changes in domain spacing ( L) and morphology evolution with increasing homopolymer content (Φ H). In 100 nm thick films, from Φ H = 0 to 0.20, the system maintains a perfect parallel lamellar structure and domains swell as predicted based on theory; however, from Φ H = 0.30 to 0.50, a morphology transition to a “dot pattern” morphology (tentatively identified as perforated lamellae) and mixed morphologies were observed before macrophase separation. In thicker films, dot patterns were observed for a broad range of Φ H before macrophase separation. The absence of the bicontinuous microemulsion phase reported for bulk blends and thin films of perpendicular lamellae and the presence of dot patterns/perforated lamellae are attributed to preferential migration of the PDMS homopolymer to the wetting layers located at the substrate and free air interfaces, which leads to an asymmetric composition within themore » film and morphology transition.« less

Authors:
 [1];  [2];  [1];  [1];  [1]; ORCiD logo [1]
  1. Tulane Univ., New Orleans, LA (United States)
  2. Argonne National Lab. (ANL), Argonne, IL (United States)
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1490075
Alternate Identifier(s):
OSTI ID: 1472190
Grant/Contract Number:  
AC02-06CH11357
Resource Type:
Journal Article: Accepted Manuscript
Journal Name:
Journal of Polymer Science. Part B, Polymer Physics
Additional Journal Information:
Journal Volume: 56; Journal Issue: 21; Journal ID: ISSN 0887-6266
Publisher:
Wiley
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; block copolymer blend; domain spacing; perforated lamellae; thin film morphology

Citation Formats

Uddin, Md Fakar, Jiang, Zhang, Raymond, Andrew, Goodson, Amy D., Lwoya, Baraka S., and Albert, Julie N. L. Thin film confinement reduces compatibility in symmetric ternary block copolymer/homopolymer blends. United States: N. p., 2018. Web. doi:10.1002/polb.24732.
Uddin, Md Fakar, Jiang, Zhang, Raymond, Andrew, Goodson, Amy D., Lwoya, Baraka S., & Albert, Julie N. L. Thin film confinement reduces compatibility in symmetric ternary block copolymer/homopolymer blends. United States. doi:10.1002/polb.24732.
Uddin, Md Fakar, Jiang, Zhang, Raymond, Andrew, Goodson, Amy D., Lwoya, Baraka S., and Albert, Julie N. L. Sun . "Thin film confinement reduces compatibility in symmetric ternary block copolymer/homopolymer blends". United States. doi:10.1002/polb.24732.
@article{osti_1490075,
title = {Thin film confinement reduces compatibility in symmetric ternary block copolymer/homopolymer blends},
author = {Uddin, Md Fakar and Jiang, Zhang and Raymond, Andrew and Goodson, Amy D. and Lwoya, Baraka S. and Albert, Julie N. L.},
abstractNote = {Here, the thin film phase behavior of ternary blends consisting of symmetric poly(styrene) (PS)–b–poly(dimethylsiloxane)(PDMS), PS, and PDMS was investigated using X–ray reflectivity (XRR) and atomic force microscopy (AFM). This system is strongly segregated, and the homopolymers are approximately the same length as the corresponding blocks of the copolymer. The XRR and AFM data are used to quantify changes in domain spacing (L) and morphology evolution with increasing homopolymer content (Φ H). In 100 nm thick films, from Φ H = 0 to 0.20, the system maintains a perfect parallel lamellar structure and domains swell as predicted based on theory; however, from Φ H = 0.30 to 0.50, a morphology transition to a “dot pattern” morphology (tentatively identified as perforated lamellae) and mixed morphologies were observed before macrophase separation. In thicker films, dot patterns were observed for a broad range of Φ H before macrophase separation. The absence of the bicontinuous microemulsion phase reported for bulk blends and thin films of perpendicular lamellae and the presence of dot patterns/perforated lamellae are attributed to preferential migration of the PDMS homopolymer to the wetting layers located at the substrate and free air interfaces, which leads to an asymmetric composition within the film and morphology transition.},
doi = {10.1002/polb.24732},
journal = {Journal of Polymer Science. Part B, Polymer Physics},
number = 21,
volume = 56,
place = {United States},
year = {Sun Sep 23 00:00:00 EDT 2018},
month = {Sun Sep 23 00:00:00 EDT 2018}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on September 23, 2019
Publisher's Version of Record

Save / Share:

Works referenced in this record:

Block Copolymer Lithography
journal, November 2013

  • Bates, Christopher M.; Maher, Michael J.; Janes, Dustin W.
  • Macromolecules, Vol. 47, Issue 1, p. 2-12
  • DOI: 10.1021/ma401762n

Controlling Polymer-Surface Interactions with Random Copolymer Brushes
journal, March 1997


Self-assembly of block copolymer thin films
journal, June 2010


Polymer-Polymer Phase Behavior
journal, February 1991


Block Copolymer Lithography: Merging �Bottom-Up� with �Top-Down� Processes
journal, December 2005

  • Hawker, Craig J.; Russell, Thomas P.
  • MRS Bulletin, Vol. 30, Issue 12, p. 952-966
  • DOI: 10.1557/mrs2005.249