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Title: Electron beam masks for compressive sensors

Abstract

Transmission microscopy imaging systems include a mask and/or other modulator situated to encode image beams, e.g., by deflecting the image beam with respect to the mask and/or sensor. The beam is modulated/masked either before or after transmission through a sample to induce a spatially and/or temporally encoded signal by modifying any of the beam/image components including the phase/coherence, intensity, or position of the beam at the sensor. For example, a mask can be placed/translated through the beam so that several masked beams are received by a sensor during a single sensor integration time. Images associated with multiple mask displacements are then used to reconstruct a video sequence using a compressive sensing method. Another example of masked modulation involves a mechanism for phase-retrieval, whereby the beam is modulated by a set of different masks in the image plane and each masked image is recorded in the diffraction plane.

Inventors:
; ; ;
Publication Date:
Research Org.:
Battelle Memorial Institute, Richland, WA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1490037
Patent Number(s):
10,109,453
Application Number:
15/075,031
Assignee:
Battelle Memorial Institute (Richland, WA) CHO
DOE Contract Number:  
FG02-03ER46057; AC05-76RL01830
Resource Type:
Patent
Resource Relation:
Patent File Date: 2016 Mar 18
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 47 OTHER INSTRUMENTATION

Citation Formats

Stevens, Andrew J., Kovarik, Libor, Browning, Nigel D., and Liyu, Andrey V.. Electron beam masks for compressive sensors. United States: N. p., 2018. Web.
Stevens, Andrew J., Kovarik, Libor, Browning, Nigel D., & Liyu, Andrey V.. Electron beam masks for compressive sensors. United States.
Stevens, Andrew J., Kovarik, Libor, Browning, Nigel D., and Liyu, Andrey V.. Tue . "Electron beam masks for compressive sensors". United States. https://www.osti.gov/servlets/purl/1490037.
@article{osti_1490037,
title = {Electron beam masks for compressive sensors},
author = {Stevens, Andrew J. and Kovarik, Libor and Browning, Nigel D. and Liyu, Andrey V.},
abstractNote = {Transmission microscopy imaging systems include a mask and/or other modulator situated to encode image beams, e.g., by deflecting the image beam with respect to the mask and/or sensor. The beam is modulated/masked either before or after transmission through a sample to induce a spatially and/or temporally encoded signal by modifying any of the beam/image components including the phase/coherence, intensity, or position of the beam at the sensor. For example, a mask can be placed/translated through the beam so that several masked beams are received by a sensor during a single sensor integration time. Images associated with multiple mask displacements are then used to reconstruct a video sequence using a compressive sensing method. Another example of masked modulation involves a mechanism for phase-retrieval, whereby the beam is modulated by a set of different masks in the image plane and each masked image is recorded in the diffraction plane.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Oct 23 00:00:00 EDT 2018},
month = {Tue Oct 23 00:00:00 EDT 2018}
}

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