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Title: On the kinetics of the removal of ligands from films of colloidal nanocrystals by plasmas

Abstract

This paper describes the kinetic limitations of etching ligands from colloidal nanocrystal assemblies (CNAs) by plasma processing.

Authors:
 [1];  [2];  [1];  [3];  [1];  [4];  [2]; ORCiD logo [3]; ORCiD logo [5]
  1. Department of Materials Science & Engineering, Iowa State University of Science and Technology, Ames, USA
  2. Instituto de Física da Universidade de São Paulo, 05508-090 São Paulo, Brazil
  3. Department of Chemistry, Iowa State University of Science and Technology, Ames, USA
  4. Michigan Ion Beam Laboratory, University of Michigan, Ann Arbor, USA
  5. Department of Materials Science & Engineering, Iowa State University of Science and Technology, Ames, USA, Department of Chemical & Biological Engineering
Publication Date:
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1489850
Grant/Contract Number:  
AC02-07CH11358
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Physical Chemistry Chemical Physics
Additional Journal Information:
Journal Name: Physical Chemistry Chemical Physics; Journal ID: ISSN 1463-9076
Publisher:
Royal Society of Chemistry (RSC)
Country of Publication:
United Kingdom
Language:
English

Citation Formats

Shaw, Santosh, Silva, Tiago F., Mohapatra, Pratyasha, Mendivelso-Perez, Deyny, Tian, Xinchun, Naab, Fabian, Rodrigues, Cleber L., Smith, Emily A., and Cademartiri, Ludovico. On the kinetics of the removal of ligands from films of colloidal nanocrystals by plasmas. United Kingdom: N. p., 2019. Web. doi:10.1039/C8CP06890A.
Shaw, Santosh, Silva, Tiago F., Mohapatra, Pratyasha, Mendivelso-Perez, Deyny, Tian, Xinchun, Naab, Fabian, Rodrigues, Cleber L., Smith, Emily A., & Cademartiri, Ludovico. On the kinetics of the removal of ligands from films of colloidal nanocrystals by plasmas. United Kingdom. doi:10.1039/C8CP06890A.
Shaw, Santosh, Silva, Tiago F., Mohapatra, Pratyasha, Mendivelso-Perez, Deyny, Tian, Xinchun, Naab, Fabian, Rodrigues, Cleber L., Smith, Emily A., and Cademartiri, Ludovico. Tue . "On the kinetics of the removal of ligands from films of colloidal nanocrystals by plasmas". United Kingdom. doi:10.1039/C8CP06890A.
@article{osti_1489850,
title = {On the kinetics of the removal of ligands from films of colloidal nanocrystals by plasmas},
author = {Shaw, Santosh and Silva, Tiago F. and Mohapatra, Pratyasha and Mendivelso-Perez, Deyny and Tian, Xinchun and Naab, Fabian and Rodrigues, Cleber L. and Smith, Emily A. and Cademartiri, Ludovico},
abstractNote = {This paper describes the kinetic limitations of etching ligands from colloidal nanocrystal assemblies (CNAs) by plasma processing.},
doi = {10.1039/C8CP06890A},
journal = {Physical Chemistry Chemical Physics},
number = ,
volume = ,
place = {United Kingdom},
year = {Tue Jan 01 00:00:00 EST 2019},
month = {Tue Jan 01 00:00:00 EST 2019}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on December 20, 2019
Publisher's Accepted Manuscript

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Works referenced in this record:

PbSe Nanocrystal Solids for n- and p-Channel Thin Film Field-Effect Transistors
journal, October 2005


Exceptionally Mild Reactive Stripping of Native Ligands from Nanocrystal Surfaces by Using Meerwein�s Salt
journal, December 2011

  • Rosen, Evelyn L.; Buonsanti, Raffaella; Llordes, Anna
  • Angewandte Chemie International Edition, Vol. 51, Issue 3, p. 684-689
  • DOI: 10.1002/anie.201105996