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Title: Precision Control of the Electron Longitudinal Bunch Shape Using an Emittance-Exchange Beam Line

Abstract

We report on the experimental generation of relativistic electron bunches with a tunable longitudinal bunch shape. A longitudinal bunch-shaping (LBS) beam line, consisting of a transverse mask followed by a transverse-to-longitudinal emittance exchange (EEX) beam line, is used to tailor the longitudinal bunch shape (or current profile) of the electron bunch. The mask shapes the bunch’s horizontal profile, and the EEX beam line converts it to a corresponding longitudinal profile. The Argonne wakefield accelerator rf photoinjector delivers electron bunches into a LBS beamline to generate a variety of longitudinal bunch shapes. The quality of the longitudinal bunch shape is limited by various perturbations in the exchange process. We develop a simple method, based on the incident slope of the bunch, to significantly suppress the perturbations

Authors:
; ; ; ; ; ; ; ; ; ; ; ; ; ; ;
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
Pohang University of Science and Technology (POSTECH); USDOE Office of Science - Office of High Energy Physics
OSTI Identifier:
1489221
DOE Contract Number:  
AC02-06CH11357
Resource Type:
Journal Article
Journal Name:
Physical Review Letters
Additional Journal Information:
Journal Volume: 118; Journal Issue: 10; Journal ID: ISSN 0031-9007
Publisher:
American Physical Society (APS)
Country of Publication:
United States
Language:
English

Citation Formats

Ha, G., Cho, M. H., Namkung, W., Power, J. G., Doran, D. S., Wisniewski, E. E., Conde, M., Gai, W., Liu, W., Whiteford, C., Gao, Q., Kim, K. -J., Zholents, A., Sun, Y. -E, Jing, C., and Piot, P. Precision Control of the Electron Longitudinal Bunch Shape Using an Emittance-Exchange Beam Line. United States: N. p., 2017. Web. doi:10.1103/PhysRevLett.118.104801.
Ha, G., Cho, M. H., Namkung, W., Power, J. G., Doran, D. S., Wisniewski, E. E., Conde, M., Gai, W., Liu, W., Whiteford, C., Gao, Q., Kim, K. -J., Zholents, A., Sun, Y. -E, Jing, C., & Piot, P. Precision Control of the Electron Longitudinal Bunch Shape Using an Emittance-Exchange Beam Line. United States. doi:10.1103/PhysRevLett.118.104801.
Ha, G., Cho, M. H., Namkung, W., Power, J. G., Doran, D. S., Wisniewski, E. E., Conde, M., Gai, W., Liu, W., Whiteford, C., Gao, Q., Kim, K. -J., Zholents, A., Sun, Y. -E, Jing, C., and Piot, P. Thu . "Precision Control of the Electron Longitudinal Bunch Shape Using an Emittance-Exchange Beam Line". United States. doi:10.1103/PhysRevLett.118.104801.
@article{osti_1489221,
title = {Precision Control of the Electron Longitudinal Bunch Shape Using an Emittance-Exchange Beam Line},
author = {Ha, G. and Cho, M. H. and Namkung, W. and Power, J. G. and Doran, D. S. and Wisniewski, E. E. and Conde, M. and Gai, W. and Liu, W. and Whiteford, C. and Gao, Q. and Kim, K. -J. and Zholents, A. and Sun, Y. -E and Jing, C. and Piot, P},
abstractNote = {We report on the experimental generation of relativistic electron bunches with a tunable longitudinal bunch shape. A longitudinal bunch-shaping (LBS) beam line, consisting of a transverse mask followed by a transverse-to-longitudinal emittance exchange (EEX) beam line, is used to tailor the longitudinal bunch shape (or current profile) of the electron bunch. The mask shapes the bunch’s horizontal profile, and the EEX beam line converts it to a corresponding longitudinal profile. The Argonne wakefield accelerator rf photoinjector delivers electron bunches into a LBS beamline to generate a variety of longitudinal bunch shapes. The quality of the longitudinal bunch shape is limited by various perturbations in the exchange process. We develop a simple method, based on the incident slope of the bunch, to significantly suppress the perturbations},
doi = {10.1103/PhysRevLett.118.104801},
journal = {Physical Review Letters},
issn = {0031-9007},
number = 10,
volume = 118,
place = {United States},
year = {2017},
month = {3}
}

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