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Title: Effect of processing conditions on additive DISC patterning of P3HT films

Abstract

There is a critical need to develop a method to pattern semiconducting polymers for device applications on the sub-micrometer scale.

Authors:
ORCiD logo [1];  [1];  [1]; ORCiD logo [1]; ORCiD logo [1]; ORCiD logo [2]; ORCiD logo [2];  [3]; ORCiD logo [3]; ORCiD logo [1]
  1. Department of Chemical Engineering, University of California, Davis, USA
  2. Department of Materials Science and Engineering, University of California, Davis, USA
  3. Department of Chemistry, University of California, Davis, USA
Publication Date:
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1485730
Grant/Contract Number:  
SC0010419
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Journal of Materials Chemistry C
Additional Journal Information:
Journal Name: Journal of Materials Chemistry C Journal Volume: 7 Journal Issue: 2; Journal ID: ISSN 2050-7526
Publisher:
Royal Society of Chemistry (RSC)
Country of Publication:
United Kingdom
Language:
English

Citation Formats

Li, Jun, Holm, Daniella M., Guda, Shravya, Bedolla-Valdez, Zaira I., Gonel, Goktug, Jacobs, Ian E., Dettmann, Makena A., Saska, Jan, Mascal, Mark, and Moulé, Adam J. Effect of processing conditions on additive DISC patterning of P3HT films. United Kingdom: N. p., 2019. Web. doi:10.1039/C8TC04519D.
Li, Jun, Holm, Daniella M., Guda, Shravya, Bedolla-Valdez, Zaira I., Gonel, Goktug, Jacobs, Ian E., Dettmann, Makena A., Saska, Jan, Mascal, Mark, & Moulé, Adam J. Effect of processing conditions on additive DISC patterning of P3HT films. United Kingdom. doi:10.1039/C8TC04519D.
Li, Jun, Holm, Daniella M., Guda, Shravya, Bedolla-Valdez, Zaira I., Gonel, Goktug, Jacobs, Ian E., Dettmann, Makena A., Saska, Jan, Mascal, Mark, and Moulé, Adam J. Thu . "Effect of processing conditions on additive DISC patterning of P3HT films". United Kingdom. doi:10.1039/C8TC04519D.
@article{osti_1485730,
title = {Effect of processing conditions on additive DISC patterning of P3HT films},
author = {Li, Jun and Holm, Daniella M. and Guda, Shravya and Bedolla-Valdez, Zaira I. and Gonel, Goktug and Jacobs, Ian E. and Dettmann, Makena A. and Saska, Jan and Mascal, Mark and Moulé, Adam J.},
abstractNote = {There is a critical need to develop a method to pattern semiconducting polymers for device applications on the sub-micrometer scale.},
doi = {10.1039/C8TC04519D},
journal = {Journal of Materials Chemistry C},
number = 2,
volume = 7,
place = {United Kingdom},
year = {Thu Jan 03 00:00:00 EST 2019},
month = {Thu Jan 03 00:00:00 EST 2019}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on December 4, 2019
Publisher's Accepted Manuscript

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Works referenced in this record:

Influence of Molecular Weight Distribution on the Gelation of P3HT and Its Impact on the Photovoltaic Performance
journal, July 2009

  • Koppe, Markus; Brabec, Christoph J.; Heiml, Sabrina
  • Macromolecules, Vol. 42, Issue 13, p. 4661-4666
  • DOI: 10.1021/ma9005445