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Title: Large Aperture and Wedged Multilayer Laue Lens for X-ray Nanofocusing

Abstract

Diffraction optics fabricated from multilayers offer an intriguing alternative to lithography-based zone plates due to their advantages of virtually limitless aspect ratio and extremely small feature size. However, other issues, intrinsic to thin-film deposition, such as film stress and deposition rate instability, for example, limit the total achievable aperture. Over the last decade, Multilayer Laue Lens (MLLs) have progressed from a mere curiosity with initial aperture sizes in the 3–10 μm range, to real beamline-deployed optics with apertures in the 40–50 μm range (X. Huang, et al., Scientific Reports 3, 3562 (2013); E. Nazaretski, et al., Rev. Sci. Instrum. 85, 033707 (2014); E. Nazaretski, et al., Journal of Synchrotron Radiation 24, 1113 (2017)). By optimizing deposition conditions and incorporating new materials, MLLs have now broken the 100 μm thickness milestone. A flat WSi2/Al–Si MLL with a deposition thickness of 102 μm, the largest MLL to date, is reviewed. New large aperture wedged MLLs (wMLL), which were first fabricated by APS in 2006 using the WSi 2/Si material system, are presented which demonstrate high focusing efficiency across a broad energy range. Furthermore, these results confirm findings by other groups who have also independently fabricated wMLL (A. J. Morgan, et al., Scientificmore » Reports 5, 9892 (2015); S. Bajt, et al., Nature Light: Science and Applications 7, 17162 (2017)) based on a similar material system.« less

Authors:
 [1];  [2];  [2];  [1];  [1];  [1];  [1];  [1];  [1]
  1. Brookhaven National Lab. (BNL), Upton, NY (United States)
  2. Argonne National Lab. (ANL), Argonne, IL (United States)
Publication Date:
Research Org.:
Brookhaven National Laboratory (BNL), Upton, NY (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1482362
Report Number(s):
BNL-209449-2018-JAAM
Journal ID: ISSN 1533-4880
Grant/Contract Number:  
SC0012704
Resource Type:
Journal Article: Accepted Manuscript
Journal Name:
Journal of Nanoscience and Nanotechnology
Additional Journal Information:
Journal Volume: 19; Journal Issue: 1; Journal ID: ISSN 1533-4880
Publisher:
American Scientific Publishers
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION; Al–Si; MLL; Multilayer; Multilayer Laue Lens; Nanofocusing; WSi2/Si; X-ray Optics

Citation Formats

Bouet, Nathalie, Macrander, Albert T., Maser, Jörg, Chu, Yong S., Zhou, Juan, Nazaretski, Evgeny, Yan, Hanfei, Huang, Xiaojing, and Conley, Ray. Large Aperture and Wedged Multilayer Laue Lens for X-ray Nanofocusing. United States: N. p., 2019. Web. doi:10.1166/jnn.2019.16479.
Bouet, Nathalie, Macrander, Albert T., Maser, Jörg, Chu, Yong S., Zhou, Juan, Nazaretski, Evgeny, Yan, Hanfei, Huang, Xiaojing, & Conley, Ray. Large Aperture and Wedged Multilayer Laue Lens for X-ray Nanofocusing. United States. doi:10.1166/jnn.2019.16479.
Bouet, Nathalie, Macrander, Albert T., Maser, Jörg, Chu, Yong S., Zhou, Juan, Nazaretski, Evgeny, Yan, Hanfei, Huang, Xiaojing, and Conley, Ray. Tue . "Large Aperture and Wedged Multilayer Laue Lens for X-ray Nanofocusing". United States. doi:10.1166/jnn.2019.16479.
@article{osti_1482362,
title = {Large Aperture and Wedged Multilayer Laue Lens for X-ray Nanofocusing},
author = {Bouet, Nathalie and Macrander, Albert T. and Maser, Jörg and Chu, Yong S. and Zhou, Juan and Nazaretski, Evgeny and Yan, Hanfei and Huang, Xiaojing and Conley, Ray},
abstractNote = {Diffraction optics fabricated from multilayers offer an intriguing alternative to lithography-based zone plates due to their advantages of virtually limitless aspect ratio and extremely small feature size. However, other issues, intrinsic to thin-film deposition, such as film stress and deposition rate instability, for example, limit the total achievable aperture. Over the last decade, Multilayer Laue Lens (MLLs) have progressed from a mere curiosity with initial aperture sizes in the 3–10 μm range, to real beamline-deployed optics with apertures in the 40–50 μm range (X. Huang, et al., Scientific Reports 3, 3562 (2013); E. Nazaretski, et al., Rev. Sci. Instrum. 85, 033707 (2014); E. Nazaretski, et al., Journal of Synchrotron Radiation 24, 1113 (2017)). By optimizing deposition conditions and incorporating new materials, MLLs have now broken the 100 μm thickness milestone. A flat WSi2/Al–Si MLL with a deposition thickness of 102 μm, the largest MLL to date, is reviewed. New large aperture wedged MLLs (wMLL), which were first fabricated by APS in 2006 using the WSi2/Si material system, are presented which demonstrate high focusing efficiency across a broad energy range. Furthermore, these results confirm findings by other groups who have also independently fabricated wMLL (A. J. Morgan, et al., Scientific Reports 5, 9892 (2015); S. Bajt, et al., Nature Light: Science and Applications 7, 17162 (2017)) based on a similar material system.},
doi = {10.1166/jnn.2019.16479},
journal = {Journal of Nanoscience and Nanotechnology},
number = 1,
volume = 19,
place = {United States},
year = {Tue Jan 01 00:00:00 EST 2019},
month = {Tue Jan 01 00:00:00 EST 2019}
}

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