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Title: Stable Silicene in Graphene/Silicene Van der Waals Heterostructures

Authors:
 [1];  [2];  [2];  [2];  [2];  [2];  [2];  [2];  [2];  [3];  [2];  [4];  [5];  [2]
  1. Institute of Physics and University of Chinese Academy of Sciences, and CAS Center for Excellence in Topological Quantum Computation, Chinese Academy of Sciences, Beijing 100190 China, Department of Physics, University of Maryland, MD 20742 USA
  2. Institute of Physics and University of Chinese Academy of Sciences, and CAS Center for Excellence in Topological Quantum Computation, Chinese Academy of Sciences, Beijing 100190 China
  3. Institute of Physics and University of Chinese Academy of Sciences, and CAS Center for Excellence in Topological Quantum Computation, Chinese Academy of Sciences, Beijing 100190 China, Department of Physics and Astronomy and Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville TN 37235 USA
  4. Department of Physics, University of Maryland, MD 20742 USA
  5. Department of Physics and Astronomy and Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville TN 37235 USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1479546
Grant/Contract Number:  
FG02-09ER46554; AC02-05CH11231
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Advanced Materials
Additional Journal Information:
Journal Name: Advanced Materials Journal Volume: 30 Journal Issue: 49; Journal ID: ISSN 0935-9648
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Li, Geng, Zhang, Lizhi, Xu, Wenyan, Pan, Jinbo, Song, Shiru, Zhang, Yi, Zhou, Haitao, Wang, Yeliang, Bao, Lihong, Zhang, Yu-Yang, Du, Shixuan, Ouyang, Min, Pantelides, Sokrates T., and Gao, Hong-Jun. Stable Silicene in Graphene/Silicene Van der Waals Heterostructures. Germany: N. p., 2018. Web. doi:10.1002/adma.201804650.
Li, Geng, Zhang, Lizhi, Xu, Wenyan, Pan, Jinbo, Song, Shiru, Zhang, Yi, Zhou, Haitao, Wang, Yeliang, Bao, Lihong, Zhang, Yu-Yang, Du, Shixuan, Ouyang, Min, Pantelides, Sokrates T., & Gao, Hong-Jun. Stable Silicene in Graphene/Silicene Van der Waals Heterostructures. Germany. doi:10.1002/adma.201804650.
Li, Geng, Zhang, Lizhi, Xu, Wenyan, Pan, Jinbo, Song, Shiru, Zhang, Yi, Zhou, Haitao, Wang, Yeliang, Bao, Lihong, Zhang, Yu-Yang, Du, Shixuan, Ouyang, Min, Pantelides, Sokrates T., and Gao, Hong-Jun. Mon . "Stable Silicene in Graphene/Silicene Van der Waals Heterostructures". Germany. doi:10.1002/adma.201804650.
@article{osti_1479546,
title = {Stable Silicene in Graphene/Silicene Van der Waals Heterostructures},
author = {Li, Geng and Zhang, Lizhi and Xu, Wenyan and Pan, Jinbo and Song, Shiru and Zhang, Yi and Zhou, Haitao and Wang, Yeliang and Bao, Lihong and Zhang, Yu-Yang and Du, Shixuan and Ouyang, Min and Pantelides, Sokrates T. and Gao, Hong-Jun},
abstractNote = {},
doi = {10.1002/adma.201804650},
journal = {Advanced Materials},
number = 49,
volume = 30,
place = {Germany},
year = {Mon Oct 08 00:00:00 EDT 2018},
month = {Mon Oct 08 00:00:00 EDT 2018}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on October 8, 2019
Publisher's Accepted Manuscript

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