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Title: High voltage semiconductor devices and methods of making the devices

Patent ·
OSTI ID:1471407

Metal-oxide-semiconductor field-effect transistor (MOSFET) devices are described which have a p-type region between the p-type well regions of the device. The p-type region can be either floating or connected to the p-type well regions by additional p-type regions. MOSFET devices are also described which have one or more p-type regions connecting the p-type well regions of the device. The p-type well regions can be arranged in a various geometric arrangements including square, diamond and hexagonal. Methods of making the devices are also described.

Research Organization:
Monolith Semiconductor Inc., Round Rock, TX (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AR0000442
Assignee:
Monolith Semiconductor Inc. (Round Rock, TX)
Patent Number(s):
10,062,749
Application Number:
14/303,019
OSTI ID:
1471407
Resource Relation:
Patent File Date: 2014 Jun 12
Country of Publication:
United States
Language:
English

References (11)

Vertical type insulated gate transistor patent March 2001
Semiconductor device and method of fabricating the same patent January 2013
Silicon carbide power devices including P-type epitaxial layers and direct ohmic contacts patent October 2014
Semiconductor device patent-application December 2003
Semiconductor device patent-application December 2003
Semiconductor Device and Method of Fabricating the Same patent-application March 2011
Silicon Carbide Substrate patent-application June 2012
Semiconductor Device and Method of Manufacturing Semiconductor Device patent-application August 2013
Semiconductor Device and Method of Manufacturing the Device patent-application December 2013
Transistor Structures Having Reduced Electrical Field at the Gate Oxide and Methods for Making Same patent-application July 2014
Field Effect Transistor Devices with Buried Well Protection Regions patent-application September 2014