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Title: Probing the ultimate plasmon confinement limits with a van der Waals heterostructure

Authors:
ORCiD logo; ORCiD logo; ORCiD logo; ORCiD logo; ; ; ; ; ORCiD logo; ORCiD logo; ORCiD logo; ORCiD logo; ; ORCiD logo
Publication Date:
Research Org.:
Energy Frontier Research Centers (EFRC) (United States). Center for Excitonics (CE)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1470434
DOE Contract Number:  
SC0001088
Resource Type:
Journal Article
Journal Name:
Science
Additional Journal Information:
Journal Volume: 360; Journal Issue: 6386; Related Information: CE partners with Massachusetts Institute of Technology (lead); Brookhaven National Laboratory; Harvard University; Journal ID: ISSN 0036-8075
Publisher:
AAAS
Country of Publication:
United States
Language:
English
Subject:
solar (photovoltaic), solid state lighting, photosynthesis (natural and artificial), charge transport, optics, synthesis (novel materials), synthesis (self-assembly), synthesis (scalable processing)

Citation Formats

Alcaraz Iranzo, David, Nanot, Sébastien, Dias, Eduardo J. C., Epstein, Itai, Peng, Cheng, Efetov, Dmitri K., Lundeberg, Mark B., Parret, Romain, Osmond, Johann, Hong, Jin-Yong, Kong, Jing, Englund, Dirk R., Peres, Nuno M. R., and Koppens, Frank H. L. Probing the ultimate plasmon confinement limits with a van der Waals heterostructure. United States: N. p., 2018. Web. doi:10.1126/science.aar8438.
Alcaraz Iranzo, David, Nanot, Sébastien, Dias, Eduardo J. C., Epstein, Itai, Peng, Cheng, Efetov, Dmitri K., Lundeberg, Mark B., Parret, Romain, Osmond, Johann, Hong, Jin-Yong, Kong, Jing, Englund, Dirk R., Peres, Nuno M. R., & Koppens, Frank H. L. Probing the ultimate plasmon confinement limits with a van der Waals heterostructure. United States. doi:10.1126/science.aar8438.
Alcaraz Iranzo, David, Nanot, Sébastien, Dias, Eduardo J. C., Epstein, Itai, Peng, Cheng, Efetov, Dmitri K., Lundeberg, Mark B., Parret, Romain, Osmond, Johann, Hong, Jin-Yong, Kong, Jing, Englund, Dirk R., Peres, Nuno M. R., and Koppens, Frank H. L. Thu . "Probing the ultimate plasmon confinement limits with a van der Waals heterostructure". United States. doi:10.1126/science.aar8438.
@article{osti_1470434,
title = {Probing the ultimate plasmon confinement limits with a van der Waals heterostructure},
author = {Alcaraz Iranzo, David and Nanot, Sébastien and Dias, Eduardo J. C. and Epstein, Itai and Peng, Cheng and Efetov, Dmitri K. and Lundeberg, Mark B. and Parret, Romain and Osmond, Johann and Hong, Jin-Yong and Kong, Jing and Englund, Dirk R. and Peres, Nuno M. R. and Koppens, Frank H. L.},
abstractNote = {},
doi = {10.1126/science.aar8438},
journal = {Science},
issn = {0036-8075},
number = 6386,
volume = 360,
place = {United States},
year = {2018},
month = {4}
}

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