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Title: Self‐Templating Approaches to Hollow Nanostructures

Journal Article · · Advanced Materials

Abstract This current research progress on the fabrication of hollow nanostructures by using self‐templating methods is reviewed. After a brief introduction to the unique properties and applications of hollow nanostructures and the three general fabrication routes, the discussions are focused on the five main self‐templating strategies, including galvanic replacement, the Kirkendall effect, Ostwald ripening, dissolution–regrowth, and the surface‐protected hollowing process. Some newly developed synthetic routes are selected and discussed in detail. In conclusion, a summary and the perspectives on the directions that might lead the future development of this exciting field are presented.

Sponsoring Organization:
USDOE
Grant/Contract Number:
DE‐SC0002247
OSTI ID:
1467745
Journal Information:
Advanced Materials, Journal Name: Advanced Materials Vol. 31 Journal Issue: 38; ISSN 0935-9648
Publisher:
Wiley Blackwell (John Wiley & Sons)Copyright Statement
Country of Publication:
Germany
Language:
English
Citation Metrics:
Cited by: 109 works
Citation information provided by
Web of Science

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