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Title: Enhanced thermoelectric efficiency in topological insulator Bi 2 Te 3 nanoplates via atomic layer deposition-based surface passivation

Authors:
 [1]; ORCiD logo [2];  [1];  [1]; ORCiD logo [3];  [4]; ORCiD logo [2]; ORCiD logo [5]
  1. Ming Hsieh Department of Electrical Engineering, University of Southern California, Los Angeles, California 90089, USA
  2. Department of Mechanical Engineering and Texas Materials Institute, University of Texas, Austin, Texas 78712, USA
  3. Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, California 90089, USA
  4. Department of Chemistry, University of Southern California, Los Angeles, California 90089, USA
  5. Ming Hsieh Department of Electrical Engineering, University of Southern California, Los Angeles, California 90089, USA, Department of Chemistry, University of Southern California, Los Angeles, California 90089, USA, Department of Physics and Astronomy, University of Southern California, Los Angeles, California 90089, USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1465902
Grant/Contract Number:  
FG02-07ER46376; FG02-07ER46377
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Name: Applied Physics Letters Journal Volume: 113 Journal Issue: 8; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Chen, Jihan, Kim, Jaehyun, Poudel, Nirakar, Hou, Bingya, Shen, Lang, Shi, Haotian, Shi, Li, and Cronin, Stephen. Enhanced thermoelectric efficiency in topological insulator Bi 2 Te 3 nanoplates via atomic layer deposition-based surface passivation. United States: N. p., 2018. Web. doi:10.1063/1.5030674.
Chen, Jihan, Kim, Jaehyun, Poudel, Nirakar, Hou, Bingya, Shen, Lang, Shi, Haotian, Shi, Li, & Cronin, Stephen. Enhanced thermoelectric efficiency in topological insulator Bi 2 Te 3 nanoplates via atomic layer deposition-based surface passivation. United States. doi:10.1063/1.5030674.
Chen, Jihan, Kim, Jaehyun, Poudel, Nirakar, Hou, Bingya, Shen, Lang, Shi, Haotian, Shi, Li, and Cronin, Stephen. Mon . "Enhanced thermoelectric efficiency in topological insulator Bi 2 Te 3 nanoplates via atomic layer deposition-based surface passivation". United States. doi:10.1063/1.5030674.
@article{osti_1465902,
title = {Enhanced thermoelectric efficiency in topological insulator Bi 2 Te 3 nanoplates via atomic layer deposition-based surface passivation},
author = {Chen, Jihan and Kim, Jaehyun and Poudel, Nirakar and Hou, Bingya and Shen, Lang and Shi, Haotian and Shi, Li and Cronin, Stephen},
abstractNote = {},
doi = {10.1063/1.5030674},
journal = {Applied Physics Letters},
number = 8,
volume = 113,
place = {United States},
year = {Mon Aug 20 00:00:00 EDT 2018},
month = {Mon Aug 20 00:00:00 EDT 2018}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on August 22, 2019
Publisher's Accepted Manuscript

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Works referenced in this record:

Thermoelectric figure of merit of a one-dimensional conductor
journal, June 1993


Nanoscale thermal transport
journal, January 2003

  • Cahill, David G.; Ford, Wayne K.; Goodson, Kenneth E.
  • Journal of Applied Physics, Vol. 93, Issue 2, p. 793-818
  • DOI: 10.1063/1.1524305