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Title: Thermal Stability of Hole-Selective Tungsten Oxide: In Situ Transmission Electron Microscopy Study

Journal Article · · Scientific Reports

In this study, the thermal stability of a contact structure featuring hole-selective tungsten oxide (WOx) and aluminum deposited onto p-type crystalline silicon (c-Si/WOx/Al) was investigated using a combination of transmission line measurements (TLM) and in situ transmission electron microscopy (TEM) studies. The TEM images provide insight into why the charge carrier transport and recombination characteristics change as a function of temperature, particularly as the samples are annealed at temperatures above 500 °C. In the as-deposited state, a ≈ 2 nm silicon oxide (SiOx) interlayer forms at the c-Si/WOx interface and a ≈ 2–3 nm aluminum oxide (AlOx) interlayer at the WOx/Al interface. When annealing above 500 °C, Al diffusion begins, and above 600 °C complete intermixing of the SiOx, WOx, AlOx and Al layers occurs. This results in a large drop in the contact resistivity, but is the likely reason surface recombination increases at these high temperatures, since a c-Si/Al contact is basically being formed. This work provides some fundamental insight that can help in the development of WOx films as hole-selective rear contacts for p-type solar cells. Furthermore, this study demonstrates that in situ TEM can provide valuable information about thermal stability of transition metal oxides functioning as carrier-selective contacts in silicon solar cells.

Research Organization:
Univ. of Central Florida, Orlando, FL (United States); Univ. of California, Oakland, CA (United States); Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division; USDOE Office of Energy Efficiency and Renewable Energy (EERE), Renewable Power Office. Solar Energy Technologies Office
Grant/Contract Number:
EE0007533; AC02- 05CH11231; AC02-05CH11231
OSTI ID:
1464976
Alternate ID(s):
OSTI ID: 1546082; OSTI ID: 1638981
Journal Information:
Scientific Reports, Journal Name: Scientific Reports Vol. 8 Journal Issue: 1; ISSN 2045-2322
Publisher:
Nature Publishing GroupCopyright Statement
Country of Publication:
United Kingdom
Language:
English
Citation Metrics:
Cited by: 18 works
Citation information provided by
Web of Science

References (22)

Characterisation of thermal annealed WO x on p-type silicon for hole-selective contacts journal July 2017
22.5% efficient silicon heterojunction solar cell with molybdenum oxide hole collector journal August 2015
Measurement of low resistive ohmic contacts on semiconductors journal January 1986
Silicon heterojunction solar cells with electron selective TiOx contact journal June 2016
A Low Resistance Calcium/Reduced Titania Passivated Contact for High Efficiency Crystalline Silicon Solar Cells journal February 2017
ITO/MoOx/a-Si:H(i) Hole-Selective Contacts for Silicon Heterojunction Solar Cells: Degradation Mechanisms and Cell Integration journal November 2017
Selectivity issues of MoOx based hole contacts journal September 2017
Transmission Electron Microscopy Studies of Electron-Selective Titanium Oxide Contacts in Silicon Solar Cells journal August 2017
Improving the a-Si:H(p) rear emitter contact of n-type silicon solar cells journal November 2012
Origin of passivation in hole-selective transition metal oxides for crystalline silicon heterojunction solar cells journal December 2016
Surface passivation of crystalline silicon solar cells: a review journal January 2000
Amorphous silicon passivated contacts for diffused junction silicon solar cells journal April 2014
Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact journal July 2015
Transmission electron microscopy based interface analysis of the origin of the variation in surface recombination of silicon for different surface preparation methods and passivation materials: Transmission electron microscopy based interface analysis journal June 2017
Transition metal oxides as hole-selective contacts in silicon heterojunctions solar cells journal February 2016
High-Performance TiO 2 -Based Electron-Selective Contacts for Crystalline Silicon Solar Cells journal May 2016
Oxygen vacancies in tungsten oxide and their influence on tungsten oxide/silicon heterojunction solar cells journal December 2016
Influence of surface preparation and cleaning on the passivation of boron diffused silicon surfaces for high efficiency photovoltaics journal August 2017
Silicon heterojunction solar cell with passivated hole selective MoO x contact journal March 2014
Molybdenum oxide MoO x : A versatile hole contact for silicon solar cells journal December 2014
Molybdenum and tungsten oxide: High work function wide band gap contact materials for hole selective contacts of silicon solar cells journal November 2015
Carrier-selective contacts for Si solar cells journal May 2014

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