Ultra-low blaze angle gratings for synchrotron and free electron laser applications
We have developed a method for the manufacture of x-ray diffraction gratings with arbitrarily small blaze angles. These gratings are made by a process in which a high blaze angle grating made by anisotropic etching of Si (111) is subjected to planarization and reactive ion etching. Differential etching of the planarization medium and silicon ensures reduction of the blaze angle. Repeated application of this process leads to gratings of increasing perfection with an arbitrarily small blaze angle. This opens the way to highly efficient low line density gratings, to damage resistant gratings for ultra-high power applications such as free electron lasers, and for extension of the use of gratings into the hard x-ray energy range for dispersive spectroscopy.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- AC02-05CH11231
- OSTI ID:
- 1463933
- Alternate ID(s):
- OSTI ID: 1480808
- Journal Information:
- Optics Express, Journal Name: Optics Express Vol. 26 Journal Issue: 17; ISSN 1094-4087
- Publisher:
- Optical Society of AmericaCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Web of Science
On smart optimization of blazed soft X-ray gratings
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journal | June 2019 |
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