Improved Coking Resistance of “Intelligent” Ni Catalysts Prepared by Atomic Layer Deposition

Journal Article · Fri Jul 13 00:00:00 EDT 2018 · ACS Catalysis

DOI:https://doi.org/10.1021/acscatal.8b01598· OSTI ID:1461634

Lin, Chao  ^[1]; Jang, Joon Baek ^[1]; Zhang, Lihua ^[2]; Stach, Eric A.  ^[1]; Gorte, Raymond J. ^[1]

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1. Univ. of Pennsylvania, Philadelphia, PA (United States)
2. Brookhaven National Lab. (BNL), Upton, NY (United States)

Conformal CaTiO₃ films were deposited onto MgAl₂O₄ by atomic layer deposition (ALD) and then examined as “intelligent” catalyst supports for Ni in the steam and CO₂ reforming of methane. CaTiO₃ films (1 nm) were characterized by scanning transmission electron microscopy and XRD and shown to be stable to at least 1073 K. Catalysts with 1 and 20 wt % Ni were studied, and it was found that, following calcination at 1073 K, the Ni-CaTiO₃/MgAl₂O₄ catalysts required high-temperature reduction to achieve activities comparable to that of their Ni/MgAl₂O₄ counterparts. However, the Ni-CaTiO₃/MgAl₂O₄ catalysts exhibited dramatically improved tolerance toward carbon-whisker formation. The carbon content on the 1 wt % Ni catalyst on CaTiO₃/MgAl₂O₄ was small even after heating the catalyst in a dry, 10% CH₄–90% He mixture at 1073 K for 12 h. As a result, possible mechanisms for the high carbon tolerance of the perovskite-containing catalysts are discussed.

• Research Organization: Univ. of Pennsylvania, Philadelphia, PA (United States)
• Sponsoring Organization: USDOE Office of Science (SC), Basic Energy Sciences (BES)
• Grant/Contract Number: SC0009440
• OSTI ID: 1461634
• Journal Information: ACS Catalysis, Vol. 8; ISSN 2155-5435
• Publisher: American Chemical Society (ACS)
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
atomic layer feposition (ALD)
CaTiO3
coking resistance
dry methane reforming
Ni catalyst
steam methane reforming
“intelligent” catalyst