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Title: Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods

Abstract

Atomic layer deposition (ALD) is a scalable deposition technique known for producing uniform, conformal films of a wide range of compounds on nearly any substrate material. These traits make it an ideal deposition method for producing films to replace the National Institute of Standards and Technology (NIST) standards and create Standard Reference Materials (SRMs) on a wide range of relevant two-dimensional and three-dimensional substrates. The use of SRM from NIST for quantitative analysis of chemical composition using synchrotron based x-ray fluorescence (SR-XRF) and scanning transmission x-ray microscopy (STXM) is common. Such standards, however, can suffer from inhomogeneity in chemical composition and thickness and often require further calculations, based on sample mounting and detector geometry, to obtain quantitative results. These inhomogeneities negatively impact the reproducibility of the measurements and the quantitative measure itself. Utilizing Rutherford backscattering, x-ray reflectivity, quartz crystal microbalance, STXM, and SR-XRF, the authors show that ALD is capable of producing high quality standards that are homogenous over scales ranging from nanometers to 100s of micrometers.

Authors:
 [1];  [2];  [3];  [4];  [5];  [6];  [2];  [7]
  1. Physics Department, Illinois Institute of Technology, Chicago, Illinois 60616
  2. Lawrence Berkley National Laboratory, Berkley, California 94720
  3. European Synchrotron Radiation Facility, Grenoble 38000, France
  4. GSECARS, University of Chicago, Argonne, Illinois 60439
  5. X-Ray Science Department, Advanced Photon Source, Argonne National Laboratory, Lemont, Illinois 60439
  6. Material Science Division, Argonne National Laboratory, Argonne, Illinois 60439
  7. Commissariat de l'énergie atomique, Centre de Saclay, Gif-sur-Yvette 91191, France
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE Office of Science - Office of High Energy Physics; National Science Foundation (NSF); USDOE Office of Science - Office of Basic Energy Sciences - Chemical Sciences, Geosciences, and Biosciences Division; USDOE Office of Science - Office of Basic Energy Sciences - Materials Sciences and Engineering Division; USDOE Office of Science - Office of Basic Energy Sciences - Scientific User Facilities Division
OSTI Identifier:
1461411
DOE Contract Number:  
AC02-06CH11357
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 36; Journal Issue: 2; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Country of Publication:
United States
Language:
English

Citation Formats

Becker, Nicholas G., Butterworth, Anna L., Salome, Murielle, Sutton, Stephen R., De Andrade, Vincent, Sokolov, Andrey, Westphal, Andrew J., and Proslier, Thomas. Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods. United States: N. p., 2018. Web. doi:10.1116/1.5025240.
Becker, Nicholas G., Butterworth, Anna L., Salome, Murielle, Sutton, Stephen R., De Andrade, Vincent, Sokolov, Andrey, Westphal, Andrew J., & Proslier, Thomas. Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods. United States. doi:10.1116/1.5025240.
Becker, Nicholas G., Butterworth, Anna L., Salome, Murielle, Sutton, Stephen R., De Andrade, Vincent, Sokolov, Andrey, Westphal, Andrew J., and Proslier, Thomas. Thu . "Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods". United States. doi:10.1116/1.5025240.
@article{osti_1461411,
title = {Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods},
author = {Becker, Nicholas G. and Butterworth, Anna L. and Salome, Murielle and Sutton, Stephen R. and De Andrade, Vincent and Sokolov, Andrey and Westphal, Andrew J. and Proslier, Thomas},
abstractNote = {Atomic layer deposition (ALD) is a scalable deposition technique known for producing uniform, conformal films of a wide range of compounds on nearly any substrate material. These traits make it an ideal deposition method for producing films to replace the National Institute of Standards and Technology (NIST) standards and create Standard Reference Materials (SRMs) on a wide range of relevant two-dimensional and three-dimensional substrates. The use of SRM from NIST for quantitative analysis of chemical composition using synchrotron based x-ray fluorescence (SR-XRF) and scanning transmission x-ray microscopy (STXM) is common. Such standards, however, can suffer from inhomogeneity in chemical composition and thickness and often require further calculations, based on sample mounting and detector geometry, to obtain quantitative results. These inhomogeneities negatively impact the reproducibility of the measurements and the quantitative measure itself. Utilizing Rutherford backscattering, x-ray reflectivity, quartz crystal microbalance, STXM, and SR-XRF, the authors show that ALD is capable of producing high quality standards that are homogenous over scales ranging from nanometers to 100s of micrometers.},
doi = {10.1116/1.5025240},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
issn = {0734-2101},
number = 2,
volume = 36,
place = {United States},
year = {2018},
month = {3}
}