Atomic layer deposition of CeO 2 using a heteroleptic cyclopentadienyl-amidinate precursor

Golalikhani, Maryam; James, Trevor; Van Buskirk, Peter; Noh, Wontae; Lee, Jooho; Wang, Ziyun; Roeder, Jeffrey F.

doi:10.1116/1.5026405

Title: Atomic layer deposition of CeO ₂ using a heteroleptic cyclopentadienyl-amidinate precursor

Journal Article · Sat Sep 01 00:00:00 EDT 2018 · Journal of Vacuum Science and Technology A

DOI:https://doi.org/10.1116/1.5026405· OSTI ID:1460497

Golalikhani, Maryam ^[1]; James, Trevor ^[1]; Van Buskirk, Peter ^[1]; Noh, Wontae ^[2]; Lee, Jooho ^[2]; Wang, Ziyun ^[2]; Roeder, Jeffrey F. ^[1]

Sonata LLC, 25 Francis J Clarke Circle, Bethel, Connecticut 06801
Air Liquide, Yonsei Engineering Research Park, 50 Yonsei-ro, Seodaemun-gu, Seoul 03722, Korea

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Sponsoring Organization:: USDOE

Grant/Contract Number:: SC0013116

OSTI ID:: 1460497

Journal Information:: Journal of Vacuum Science and Technology A, Journal Name: Journal of Vacuum Science and Technology A Vol. 36 Journal Issue: 5; ISSN 0734-2101

Publisher:: American Vacuum SocietyCopyright Statement

Country of Publication:: United States

Language:: English

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References (29)

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Title: Atomic layer deposition of CeO ₂ using a heteroleptic cyclopentadienyl-amidinate precursor