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Title: Tuning metal-insulator behavior in LaTiO 3/SrTiO 3 heterostructures integrated directly on Si(100) through control of atomic layer thickness

Authors:
 [1];  [2];  [1]; ORCiD logo [1];  [1];  [1]; ORCiD logo [3];  [4]; ORCiD logo [2];  [1]
  1. Department of Physics, University of Texas-Arlington, Arlington, Texas 76019, USA
  2. Department of Physics, North Carolina State University, Raleigh, North Carolina 27695, USA
  3. Center for Functional Nanomaterials, Brookhaven National Laboratory,, Upton, New York 11973, USA
  4. Institute of Physics, New York University Shanghai, Pudong, Shanghai 200122, China
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
Sponsoring Org.:
National Science Foundation (NSF)
OSTI Identifier:
1459973
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 112; Journal Issue: 19
Country of Publication:
United States
Language:
ENGLISH

Citation Formats

Ahmadi-Majlan, Kamyar, Chen, Tongjie, Lim, Zheng Hui, Conlin, Patrick, Hensley, Ricky, Chrysler, Matthew, Su, Dong, Chen, Hanghui, Kumah, Divine P., and Ngai, Joseph H. Tuning metal-insulator behavior in LaTiO3/SrTiO3 heterostructures integrated directly on Si(100) through control of atomic layer thickness. United States: N. p., 2018. Web. doi:10.1063/1.5018069.
Ahmadi-Majlan, Kamyar, Chen, Tongjie, Lim, Zheng Hui, Conlin, Patrick, Hensley, Ricky, Chrysler, Matthew, Su, Dong, Chen, Hanghui, Kumah, Divine P., & Ngai, Joseph H. Tuning metal-insulator behavior in LaTiO3/SrTiO3 heterostructures integrated directly on Si(100) through control of atomic layer thickness. United States. doi:10.1063/1.5018069.
Ahmadi-Majlan, Kamyar, Chen, Tongjie, Lim, Zheng Hui, Conlin, Patrick, Hensley, Ricky, Chrysler, Matthew, Su, Dong, Chen, Hanghui, Kumah, Divine P., and Ngai, Joseph H. Mon . "Tuning metal-insulator behavior in LaTiO3/SrTiO3 heterostructures integrated directly on Si(100) through control of atomic layer thickness". United States. doi:10.1063/1.5018069.
@article{osti_1459973,
title = {Tuning metal-insulator behavior in LaTiO3/SrTiO3 heterostructures integrated directly on Si(100) through control of atomic layer thickness},
author = {Ahmadi-Majlan, Kamyar and Chen, Tongjie and Lim, Zheng Hui and Conlin, Patrick and Hensley, Ricky and Chrysler, Matthew and Su, Dong and Chen, Hanghui and Kumah, Divine P. and Ngai, Joseph H.},
abstractNote = {},
doi = {10.1063/1.5018069},
journal = {Applied Physics Letters},
number = 19,
volume = 112,
place = {United States},
year = {Mon May 07 00:00:00 EDT 2018},
month = {Mon May 07 00:00:00 EDT 2018}
}