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Title: Amorphous boron oxide at megabar pressures via inelastic X-ray scattering

Authors:
ORCiD logo; ; ; ; ;
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
Sponsoring Org.:
DOE - BASIC ENERGY SCIENCESNSFDOE-NNSAINDUSTRYFOREIGN
OSTI Identifier:
1459011
Resource Type:
Journal Article
Resource Relation:
Journal Name: Proceedings of the National Academy of Sciences of the United States of America; Journal Volume: 115; Journal Issue: 23
Country of Publication:
United States
Language:
ENGLISH

Citation Formats

Lee, Sung Keun, Kim, Yong-Hyun, Chow, Paul, Xiao, Yunming, Ji, Cheng, and Shen, Guoyin. Amorphous boron oxide at megabar pressures via inelastic X-ray scattering. United States: N. p., 2018. Web. doi:10.1073/pnas.1800777115.
Lee, Sung Keun, Kim, Yong-Hyun, Chow, Paul, Xiao, Yunming, Ji, Cheng, & Shen, Guoyin. Amorphous boron oxide at megabar pressures via inelastic X-ray scattering. United States. doi:10.1073/pnas.1800777115.
Lee, Sung Keun, Kim, Yong-Hyun, Chow, Paul, Xiao, Yunming, Ji, Cheng, and Shen, Guoyin. Mon . "Amorphous boron oxide at megabar pressures via inelastic X-ray scattering". United States. doi:10.1073/pnas.1800777115.
@article{osti_1459011,
title = {Amorphous boron oxide at megabar pressures via inelastic X-ray scattering},
author = {Lee, Sung Keun and Kim, Yong-Hyun and Chow, Paul and Xiao, Yunming and Ji, Cheng and Shen, Guoyin},
abstractNote = {},
doi = {10.1073/pnas.1800777115},
journal = {Proceedings of the National Academy of Sciences of the United States of America},
number = 23,
volume = 115,
place = {United States},
year = {Mon May 21 00:00:00 EDT 2018},
month = {Mon May 21 00:00:00 EDT 2018}
}