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Title: Directed Atom-by-Atom Assembly of Dopants in Silicon

Journal Article · · ACS Nano
ORCiD logo [1];  [2];  [3];  [2];  [4];  [3]; ORCiD logo [5];  [1]
  1. Materials Sciences and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 United States, The Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 United States
  2. Materials Sciences and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 United States
  3. Materials Sciences and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 United States, Department of Physics and Astronomy, Vanderbilt University, Nashville, Tennessee 37235 United States
  4. Computational Sciences and Engineering Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 United States
  5. Materials Sciences and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 United States, Department of Physics and Astronomy, The University of Tennessee, Knoxville, Tennessee 37996 United States

The ability to controllably position single atoms inside materials is key for the ultimate fabrication of devices with functionalities governed by atomic-scale properties. Single bismuth dopant atoms in silicon provide an ideal case study in view of proposals for single-dopant quantum bits. However, bismuth is the least soluble pnictogen in silicon, meaning that the dopant atoms tend to migrate out of position during sample growth. Here, we demonstrate epitaxial growth of thin silicon films doped with bismuth. We use atomic-resolution aberration-corrected imaging to view the as-grown dopant distribution and then to controllably position single dopants inside the film. Atomic-scale quantum-mechanical calculations corroborate the experimental findings. Finally, these results indicate that the scanning transmission electron microscope is of particular interest for assembling functional materials atom-by-atom because it offers both real-time monitoring and atom manipulation. Lastly, we envision electron-beam manipulation of atoms inside materials as an achievable route to controllable assembly of structures of individual dopants.

Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
USDOE; USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22). Materials Sciences & Engineering Division
Grant/Contract Number:
AC05-00OR22725; FG02-09ER46554; AC02-05CH11231
OSTI ID:
1457489
Alternate ID(s):
OSTI ID: 1458376
Journal Information:
ACS Nano, Journal Name: ACS Nano Vol. 12 Journal Issue: 6; ISSN 1936-0851
Publisher:
American Chemical SocietyCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 44 works
Citation information provided by
Web of Science

Cited By (11)

Atom-by-atom fabrication with electron beams journal June 2019
Electron‐Beam Manipulation of Silicon Impurities in Single‐Walled Carbon Nanotubes journal June 2019
Atomic Mechanisms for the Si Atom Dynamics in Graphene: Chemical Transformations at the Edge and in the Bulk journal November 2019
The microscope revolution that’s sweeping through materials science journal November 2018
Manifold learning of four-dimensional scanning transmission electron microscopy journal January 2019
Influence of temperature on the displacement threshold energy in graphene journal September 2019
Quantifying transmission electron microscopy irradiation effects using two-dimensional materials journal May 2019
Engineered electronic states in atomically precise artificial lattices and graphene nanoribbons journal January 2019
Blue-light-emitting color centers in high-quality hexagonal boron nitride journal October 2019
Engineering single-atom dynamics with electron irradiation journal May 2019
Quantum defects by design journal October 2019