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Title: Janus Membranes via Diffusion-Controlled Atomic Layer Deposition

Authors:
 [1];  [2];  [3];  [4];  [3]; ORCiD logo [5]
  1. Institute for Molecular Engineering, University of Chicago, 5640 South Ellis Avenue Chicago IL 60637 USA, Center for Nanoscale Materials, Argonne National Laboratory, 9700 South Cass Avenue Argonne IL 60439 USA
  2. Center for Nanoscale Materials, Argonne National Laboratory, 9700 South Cass Avenue Argonne IL 60439 USA
  3. Applied Materials Division, Argonne National Laboratory, 9700 South Cass Avenue Argonne IL 60439 USA
  4. Institute for Molecular Engineering, University of Chicago, 5640 South Ellis Avenue Chicago IL 60637 USA, Materials Science Division, Argonne National Laboratory, 9700 South Cass Avenue Argonne IL 60439 USA
  5. Institute for Molecular Engineering, University of Chicago, 5640 South Ellis Avenue Chicago IL 60637 USA, Center for Nanoscale Materials, Argonne National Laboratory, 9700 South Cass Avenue Argonne IL 60439 USA, Institute for Molecular Engineering, Argonne National Laboratory, 9700 South Cass Avenue Argonne IL 60439 USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1452659
Grant/Contract Number:
AC02-06CH11357
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Advanced Materials Interfaces
Additional Journal Information:
Related Information: CHORUS Timestamp: 2018-06-13 01:46:57; Journal ID: ISSN 2196-7350
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Waldman, Ruben Z., Yang, Hao-Cheng, Mandia, David J., Nealey, Paul F., Elam, Jeffrey W., and Darling, Seth B. Janus Membranes via Diffusion-Controlled Atomic Layer Deposition. Germany: N. p., 2018. Web. doi:10.1002/admi.201800658.
Waldman, Ruben Z., Yang, Hao-Cheng, Mandia, David J., Nealey, Paul F., Elam, Jeffrey W., & Darling, Seth B. Janus Membranes via Diffusion-Controlled Atomic Layer Deposition. Germany. doi:10.1002/admi.201800658.
Waldman, Ruben Z., Yang, Hao-Cheng, Mandia, David J., Nealey, Paul F., Elam, Jeffrey W., and Darling, Seth B. Tue . "Janus Membranes via Diffusion-Controlled Atomic Layer Deposition". Germany. doi:10.1002/admi.201800658.
@article{osti_1452659,
title = {Janus Membranes via Diffusion-Controlled Atomic Layer Deposition},
author = {Waldman, Ruben Z. and Yang, Hao-Cheng and Mandia, David J. and Nealey, Paul F. and Elam, Jeffrey W. and Darling, Seth B.},
abstractNote = {},
doi = {10.1002/admi.201800658},
journal = {Advanced Materials Interfaces},
number = ,
volume = ,
place = {Germany},
year = {Tue Jun 12 00:00:00 EDT 2018},
month = {Tue Jun 12 00:00:00 EDT 2018}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on June 12, 2019
Publisher's Accepted Manuscript

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