X-ray metrology and performance of a 45-cm long x-ray deformable mirror
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS)
We describe experiments with a 45-cm long x-ray deformable mirror (XDM) that have been conducted in End Station 2, Beamline 5.3.1 at the Advanced Light Source. A detailed description of the hardware implementation is provided. We explain our one-dimensional Fresnel propagation code that correctly handles grazing incidence and includes a model of the XDM. This code is used to simulate and verify experimental results. Initial long trace profiler metrology of the XDM at 7.5 keV is presented. The ability to measure a large (150-nm amplitude) height change on the XDM is demonstrated. The results agree well with the simulated experiment at an error level of 1 μrad RMS. Direct imaging of the x-ray beam also shows the expected change in intensity profile at the detector.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- AC52-07NA27344; AC02-05CH11231
- OSTI ID:
- 1260489
- Alternate ID(s):
- OSTI ID: 1440927
- Report Number(s):
- LLNL-JRNL-678726; RSINAK
- Journal Information:
- Review of Scientific Instruments, Vol. 87, Issue 5; ISSN 0034-6748
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
Web of Science
Non-contact XUV metrology of Ru/B 4 C multilayer optics by means of Hartmann wavefront analysis
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journal | January 2018 |
Non-contact XUV metrology of Ru/B4C multilayer optics by means of Hartmann wavefront analysis | text | January 2018 |
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