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Title: Hydrogen annealing effects on local structures and oxidation states of atomic layer deposited SnO x

Authors:
 [1];  [2];  [2];  [3];  [4]
  1. Department of Chemical Engineering, University of Illinois at Chicago, Chicago, Illinois 60607
  2. Department of Materials Science and Engineering, Institute of Materials Science, University of Connecticut, Storrs, Connecticut 06269-3136
  3. Departments of Bioengineering and Chemistry, University of Illinois at Chicago, Chicago, Illinois 60607
  4. Department of Bioengineering and Chemical Engineering, University of Illinois at Chicago, Chicago, Illinois 60607
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
Sponsoring Org.:
National Science Foundation (NSF)
OSTI Identifier:
1437470
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 36; Journal Issue: 3; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Country of Publication:
United States
Language:
ENGLISH

Citation Formats

Chang, Siliang, Vijayan, Sriram, Aindow, Mark, Jursich, Gregory, and Takoudis, Christos G. Hydrogen annealing effects on local structures and oxidation states of atomic layer deposited SnOx. United States: N. p., 2018. Web. doi:10.1116/1.5026696.
Chang, Siliang, Vijayan, Sriram, Aindow, Mark, Jursich, Gregory, & Takoudis, Christos G. Hydrogen annealing effects on local structures and oxidation states of atomic layer deposited SnOx. United States. doi:10.1116/1.5026696.
Chang, Siliang, Vijayan, Sriram, Aindow, Mark, Jursich, Gregory, and Takoudis, Christos G. Tue . "Hydrogen annealing effects on local structures and oxidation states of atomic layer deposited SnOx". United States. doi:10.1116/1.5026696.
@article{osti_1437470,
title = {Hydrogen annealing effects on local structures and oxidation states of atomic layer deposited SnOx},
author = {Chang, Siliang and Vijayan, Sriram and Aindow, Mark and Jursich, Gregory and Takoudis, Christos G.},
abstractNote = {},
doi = {10.1116/1.5026696},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
issn = {0734-2101},
number = 3,
volume = 36,
place = {United States},
year = {2018},
month = {5}
}