Magnetic Memory from Site Isolated Dy(III) on Silica Materials
- Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1-5, CH-8093 Zürich, Switzerland
- Chemical Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States
- Univ Lyon, Ecole Normale supérieure de Lyon, Laboratoire de Chimie UMR 5182 CNRS—Université Claude Bernard Lyon 1—ENS Lyon, 46 Allée d’Italie, 69364 Lyon Cedex 07, France
- Institut des Sciences Chimiques de Rennes UMR 6226 CNRS-UR1, Université de Rennes 1, 35042 Rennes Cedex, France
- Swiss Light Source, Paul Scherrer Institute, CH-5232 Villigen PSI, Switzerland
- Laboratoire de Chimie des Processus Biologiques, CNRS UMR 8229, Collège de France, Université Pierre et Marie Curie, 11 Place Marcelin Berthelot, 75231 Paris Cedex 05, France
© 2017 American Chemical Society. Achieving magnetic remanence at single isolated metal sites dispersed at the surface of a solid matrix has been envisioned as a key step toward information storage and processing in the smallest unit of matter. Here, we show that isolated Dy(III) sites distributed at the surface of silica nanoparticles, prepared with a simple and scalable two-step process, show magnetic remanence and display a hysteresis loop open at liquid 4 He temperature, in contrast to the molecular precursor which does not display any magnetic memory. This singular behavior is achieved through the controlled grafting of a tailored Dy(III) siloxide complex on partially dehydroxylated silica nanoparticles followed by thermal annealing. This approach allows control of the density and the structure of isolated, bare Dy(III) sites bound to the silica surface. During the process, all organic fragments are removed, leaving the surface as the sole ligand, promoting magnetic remanence.
- Research Organization:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- AC02-05CH11231; AC02-76SF00515; FP7-PEOPLE-2012-ITN N?317127
- OSTI ID:
- 1344432
- Alternate ID(s):
- OSTI ID: 1352052; OSTI ID: 1436623
- Journal Information:
- ACS Central Science, Journal Name: ACS Central Science Vol. 3 Journal Issue: 3; ISSN 2374-7943
- Publisher:
- American Chemical SocietyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Web of Science
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