Dose dependence of radiation damage in nano-structured amorphous SiOC/crystalline Fe composite
Journal Article
·
· Materials Research Letters
- Univ. of Nebraska-Lincoln, Lincoln, NE (United States)
- Texas A & M Univ., College Station, TX (United States)
Here, through examination of radiation tolerance properties of amorphous silicon oxycarbide (SiOC) and crystalline Fe composite to averaged damage levels, from approximately 8 to 30 displacements per atom (dpa), we demonstrated that the Fe/SiOC interface and the Fe/amorphous FexSiyOz interface act as efficient defect sinks and promote the recombination of vacancies and interstitials. For thick Fe/SiOC multilayers, a clear Fe/SiOC interface remained and no irradiation-induced mixing was observed even after 32 dpa. For thin Fe/SiOC multilayers, an amorphous FexSiyOz intermixed layer was observed to form at 8 dpa, but no further layer growth was observed for higher dpa levels.
- Research Organization:
- Univ. of Nebraska, Lincoln, NE (United States)
- Sponsoring Organization:
- USDOE Office of Nuclear Energy (NE)
- Grant/Contract Number:
- NE0000533
- OSTI ID:
- 1435600
- Journal Information:
- Materials Research Letters, Vol. 4, Issue 1; ISSN 2166-3831
- Publisher:
- Taylor and FrancisCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 19 works
Citation information provided by
Web of Science
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