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Title: Control of thermal expansion in a low-density framework modification of silicon

Authors:
 [1]; ORCiD logo [2];  [3];  [1];  [1];  [4]
  1. Department of Physics, California Polytechnic State University, San Luis Obispo, California 93407, USA
  2. Department of Chemistry, Illinois Institute of Technology, Chicago, Illinois 60616, USA, Department of Physics, North Central College, Naperville, Illinois 60540, USA
  3. Materials Measurement Science Division, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
  4. Department of Physics, University of South Florida, Tampa, Florida 33620, USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1435392
Grant/Contract Number:  
AC02-06CH11357
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Name: Applied Physics Letters Journal Volume: 112 Journal Issue: 18; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Beekman, Matt, Kaduk, James A., Wong-Ng, Winnie, Troesch, Michael, Lee, Glenn S., and Nolas, George S. Control of thermal expansion in a low-density framework modification of silicon. United States: N. p., 2018. Web. doi:10.1063/1.5027229.
Beekman, Matt, Kaduk, James A., Wong-Ng, Winnie, Troesch, Michael, Lee, Glenn S., & Nolas, George S. Control of thermal expansion in a low-density framework modification of silicon. United States. doi:10.1063/1.5027229.
Beekman, Matt, Kaduk, James A., Wong-Ng, Winnie, Troesch, Michael, Lee, Glenn S., and Nolas, George S. Mon . "Control of thermal expansion in a low-density framework modification of silicon". United States. doi:10.1063/1.5027229.
@article{osti_1435392,
title = {Control of thermal expansion in a low-density framework modification of silicon},
author = {Beekman, Matt and Kaduk, James A. and Wong-Ng, Winnie and Troesch, Michael and Lee, Glenn S. and Nolas, George S.},
abstractNote = {},
doi = {10.1063/1.5027229},
journal = {Applied Physics Letters},
issn = {0003-6951},
number = 18,
volume = 112,
place = {United States},
year = {2018},
month = {4}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record at 10.1063/1.5027229

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Works referenced in this record:

A profile refinement method for nuclear and magnetic structures
journal, June 1969