Room-temperature relaxor ferroelectricity and photovoltaic effects in tin titanate directly deposited on a silicon substrate
- Univ. of Puerto Rico, San Juan, PR (United States). Dept. of Physics and Inst. for Functional Nanomaterials
- Argonne National Lab. (ANL), Argonne, IL (United States). Materials Science Division; Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Univ. of Illinois, Chicago, IL (United States). Dept. of Chemical Engineering
- Univ. of Connecticut, Storrs, CT (United States). Inst. of Materials Science, Dept. of Materials Science and Engineering
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Univ. of Illinois, Chicago, IL (United States). Dept. of Chemical Engineering, and Dept. of Bioengineering
- Univ. of St. Andrews, Scotland (United Kingdom). School of Chemistry
- Univ. of St. Andrews, Scotland (United Kingdom). School of Physics and Astronomy
- Argonne National Lab. (ANL), Argonne, IL (United States). Materials Science Division; Korea Advanced Inst. Science and Technology (KAIST), Daejeon (Korea, Republic of). Dept. of Materials Science and Engineering
Tin titanate (SnTiO3) has been notoriously impossible to prepare as a thin-film ferroelectric, probably because high-temperature annealing converts much of the Sn2+ to Sn4+. In the present paper, we show two things: first, perovskite phase SnTiO3 can be prepared by atomic-layer deposition directly onto p-type Si substrates; and second, these films exhibit ferroelectric switching at room temperature, with p-type Si acting as electrodes. X-ray diffraction measurements reveal that the film is single-phase, preferred-orientation ferroelectric perovskite SnTiO3. Our films showed well-saturated, square, and repeatable hysteresis loops of around 3μC/cm2 remnant polarization at room temperature, as detected by out-of-plane polarization versus electric field and field cycling measurements. Furthermore, photovoltaic and photoferroelectricity were found in Pt/SnTiO3/Si/SnTiO3/Pt heterostructures, the properties of which can be tuned through band-gap engineering by strain according to first-principles calculations. This is a lead-free room-temperature ferroelectric oxide of potential device application.
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States); Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Sponsoring Organization:
- National Science Foundation (NSF); USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22). Materials Sciences & Engineering Division; USDOD; National Research Foundation of Korea (NRF); USDOE
- Grant/Contract Number:
- AC02-06CH11357; FA95501610295; 1002410; AC05-00OR22725
- OSTI ID:
- 1425214
- Alternate ID(s):
- OSTI ID: 1421879; OSTI ID: 1435330
- Journal Information:
- Physical Review B, Vol. 97, Issue 5; ISSN 2469-9950
- Publisher:
- American Physical Society (APS)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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