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Title: Large Photothermal Effect in Sub-40 nm h-BN Nanostructures Patterned Via High-Resolution Ion Beam

Authors:
ORCiD logo [1];  [2];  [3];  [4];  [2];  [5];  [6];  [7];  [6];  [4];  [6];  [8];  [8];  [1];  [9];  [6];  [6]
  1. Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge MA 02139 USA
  2. Center for Nanoscale Systems, Harvard University, Cambridge MA 02138 USA
  3. Department of Physics, University of California, San Diego La Jolla CA 92093 USA
  4. Carl Zeiss Microscopy, LLC, Peabody MA 01960 USA
  5. Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore 637371 Singapore
  6. Department of Physics, Massachusetts Institute of Technology, Cambridge MA 02139 USA
  7. Department of Electrical Engineering, The Pennsylvania State University, University Park PA 16802 USA
  8. National Institute for Materials Science, Namiki 1-1 Tsukuba Ibaraki 305-0044 Japan
  9. Department of Physics, Columbia University, New York NY 10027 USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1434374
Grant/Contract Number:
DESC0001088
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Small
Additional Journal Information:
Journal Volume: 14; Journal Issue: 22; Related Information: CHORUS Timestamp: 2018-05-31 18:25:53; Journal ID: ISSN 1613-6810
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

López, Josué J., Ambrosio, Antonio, Dai, Siyuan, Huynh, Chuong, Bell, David C., Lin, Xiao, Rivera, Nicholas, Huang, Shengxi, Ma, Qiong, Eyhusen, Soeren, Kaminer, Ido E., Watanabe, Kenji, Taniguchi, Takashi, Kong, Jing, Basov, Dimitri N., Jarillo-Herrero, Pablo, and Soljačić, Marin. Large Photothermal Effect in Sub-40 nm h-BN Nanostructures Patterned Via High-Resolution Ion Beam. Germany: N. p., 2018. Web. doi:10.1002/smll.201800072.
López, Josué J., Ambrosio, Antonio, Dai, Siyuan, Huynh, Chuong, Bell, David C., Lin, Xiao, Rivera, Nicholas, Huang, Shengxi, Ma, Qiong, Eyhusen, Soeren, Kaminer, Ido E., Watanabe, Kenji, Taniguchi, Takashi, Kong, Jing, Basov, Dimitri N., Jarillo-Herrero, Pablo, & Soljačić, Marin. Large Photothermal Effect in Sub-40 nm h-BN Nanostructures Patterned Via High-Resolution Ion Beam. Germany. doi:10.1002/smll.201800072.
López, Josué J., Ambrosio, Antonio, Dai, Siyuan, Huynh, Chuong, Bell, David C., Lin, Xiao, Rivera, Nicholas, Huang, Shengxi, Ma, Qiong, Eyhusen, Soeren, Kaminer, Ido E., Watanabe, Kenji, Taniguchi, Takashi, Kong, Jing, Basov, Dimitri N., Jarillo-Herrero, Pablo, and Soljačić, Marin. Tue . "Large Photothermal Effect in Sub-40 nm h-BN Nanostructures Patterned Via High-Resolution Ion Beam". Germany. doi:10.1002/smll.201800072.
@article{osti_1434374,
title = {Large Photothermal Effect in Sub-40 nm h-BN Nanostructures Patterned Via High-Resolution Ion Beam},
author = {López, Josué J. and Ambrosio, Antonio and Dai, Siyuan and Huynh, Chuong and Bell, David C. and Lin, Xiao and Rivera, Nicholas and Huang, Shengxi and Ma, Qiong and Eyhusen, Soeren and Kaminer, Ido E. and Watanabe, Kenji and Taniguchi, Takashi and Kong, Jing and Basov, Dimitri N. and Jarillo-Herrero, Pablo and Soljačić, Marin},
abstractNote = {},
doi = {10.1002/smll.201800072},
journal = {Small},
number = 22,
volume = 14,
place = {Germany},
year = {Tue Apr 24 00:00:00 EDT 2018},
month = {Tue Apr 24 00:00:00 EDT 2018}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on April 24, 2019
Publisher's Accepted Manuscript

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