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Title: Methods to introduce sub-micrometer, symmetry-breaking surface corrugation to silicon substrates to increase light trapping

Abstract

Provided is a method for fabricating a nanopatterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry-breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces.

Inventors:
; ; ;
Publication Date:
Research Org.:
STC.UNM, Albuquerque, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1433847
Patent Number(s):
9,941,426
Application Number:
15/389,936; CHE-1231046
Assignee:
STC.UNM (Albuquerque, NM) ORISE
Resource Type:
Patent
Resource Relation:
Patent File Date: 2016 Dec 23
Country of Publication:
United States
Language:
English

Citation Formats

Han, Sang Eon, Hoard, Brittany R., Han, Sang M., and Ghosh, Swapnadip. Methods to introduce sub-micrometer, symmetry-breaking surface corrugation to silicon substrates to increase light trapping. United States: N. p., 2018. Web.
Han, Sang Eon, Hoard, Brittany R., Han, Sang M., & Ghosh, Swapnadip. Methods to introduce sub-micrometer, symmetry-breaking surface corrugation to silicon substrates to increase light trapping. United States.
Han, Sang Eon, Hoard, Brittany R., Han, Sang M., and Ghosh, Swapnadip. Tue . "Methods to introduce sub-micrometer, symmetry-breaking surface corrugation to silicon substrates to increase light trapping". United States. doi:. https://www.osti.gov/servlets/purl/1433847.
@article{osti_1433847,
title = {Methods to introduce sub-micrometer, symmetry-breaking surface corrugation to silicon substrates to increase light trapping},
author = {Han, Sang Eon and Hoard, Brittany R. and Han, Sang M. and Ghosh, Swapnadip},
abstractNote = {Provided is a method for fabricating a nanopatterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry-breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Apr 10 00:00:00 EDT 2018},
month = {Tue Apr 10 00:00:00 EDT 2018}
}

Patent:

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