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Title: Rapid feedback of chemical vapor deposition growth mechanisms by operando X-ray diffraction

Abstract

An operando x-ray diffraction system is presented for elucidating optimal laser assisted chemical vapor deposition growth conditions. The technique is utilized to investigate deposition dynamics of boron-carbon materials using trimethyl borate precursor. Trimethyl borate exhibits vastly reduced toxicological and flammability hazards compared to existing precursors, but has previously not been applied to boron carbide growth. Crystalline boron-rich carbide material is produced in a narrow growth regime on addition of hydrogen during the growth phase at high temperature. Finally, the use of the operando x-ray diffraction system allows for the exploration of highly nonequilibrium conditions and rapid process control, which are not possible using ex situ diagnostics.

Authors:
 [1];  [1];  [1];  [1];  [1];  [1];  [1];  [1]
  1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States). Physical and Life Sciences Directorate
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1430996
Alternate Identifier(s):
OSTI ID: 1426005
Report Number(s):
LLNL-JRNL-717099
Journal ID: ISSN 2166-2746
Grant/Contract Number:  
AC52-07NA27344; AC02-06CH11357
Resource Type:
Journal Article: Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics
Additional Journal Information:
Journal Volume: 36; Journal Issue: 2; Journal ID: ISSN 2166-2746
Publisher:
American Vacuum Society/AIP
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Martin, Aiden A., Depond, Philip J., Bagge-Hansen, Michael, Lee, Jonathan R. I., Yoo, Jae-Hyuck, Elhadj, Selim, Matthews, Manyalibo J., and van Buuren, Tony. Rapid feedback of chemical vapor deposition growth mechanisms by operando X-ray diffraction. United States: N. p., 2018. Web. doi:10.1116/1.5019742.
Martin, Aiden A., Depond, Philip J., Bagge-Hansen, Michael, Lee, Jonathan R. I., Yoo, Jae-Hyuck, Elhadj, Selim, Matthews, Manyalibo J., & van Buuren, Tony. Rapid feedback of chemical vapor deposition growth mechanisms by operando X-ray diffraction. United States. doi:10.1116/1.5019742.
Martin, Aiden A., Depond, Philip J., Bagge-Hansen, Michael, Lee, Jonathan R. I., Yoo, Jae-Hyuck, Elhadj, Selim, Matthews, Manyalibo J., and van Buuren, Tony. Wed . "Rapid feedback of chemical vapor deposition growth mechanisms by operando X-ray diffraction". United States. doi:10.1116/1.5019742. https://www.osti.gov/servlets/purl/1430996.
@article{osti_1430996,
title = {Rapid feedback of chemical vapor deposition growth mechanisms by operando X-ray diffraction},
author = {Martin, Aiden A. and Depond, Philip J. and Bagge-Hansen, Michael and Lee, Jonathan R. I. and Yoo, Jae-Hyuck and Elhadj, Selim and Matthews, Manyalibo J. and van Buuren, Tony},
abstractNote = {An operando x-ray diffraction system is presented for elucidating optimal laser assisted chemical vapor deposition growth conditions. The technique is utilized to investigate deposition dynamics of boron-carbon materials using trimethyl borate precursor. Trimethyl borate exhibits vastly reduced toxicological and flammability hazards compared to existing precursors, but has previously not been applied to boron carbide growth. Crystalline boron-rich carbide material is produced in a narrow growth regime on addition of hydrogen during the growth phase at high temperature. Finally, the use of the operando x-ray diffraction system allows for the exploration of highly nonequilibrium conditions and rapid process control, which are not possible using ex situ diagnostics.},
doi = {10.1116/1.5019742},
journal = {Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics},
issn = {2166-2746},
number = 2,
volume = 36,
place = {United States},
year = {2018},
month = {3}
}

Journal Article:
Free Publicly Available Full Text
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