skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Development of Critical Technologies of Soft X-Ray Lithography Final Report CRADA No. TC-0503-93

Abstract

The project is a relationship between the Lawrence Livermore National Laboratory (LLITL) and Advanced Micro Devices, Incorporated, KLA Instruments Corporation, Hoya Corporation USA, GCA Tropel, and Micrion Corporation.

Authors:
 [1];  [2];  [3];  [4];  [5];  [6]
  1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
  2. Advanced Micro Devices, Sunnyvale, CA (United States)
  3. KLA Instruments Corporation, San Jose, CA (United States)
  4. Hoya Corporation USA, Sunnyvale, CA (United States)
  5. GCA Tropel, Fairport, NY (United States)
  6. Micrion Corporation, Peabody, MA (United States)
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1430945
Report Number(s):
LLNL-TR-747753
DOE Contract Number:  
AC52-07NA27344
Resource Type:
Technical Report
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION; 42 ENGINEERING

Citation Formats

Kania, Don, Kyser, David, Meisburger, W. D., Suzuki, Hiroshi, Bruning, John H., and Economou, Nicholas P. Development of Critical Technologies of Soft X-Ray Lithography Final Report CRADA No. TC-0503-93. United States: N. p., 2018. Web. doi:10.2172/1430945.
Kania, Don, Kyser, David, Meisburger, W. D., Suzuki, Hiroshi, Bruning, John H., & Economou, Nicholas P. Development of Critical Technologies of Soft X-Ray Lithography Final Report CRADA No. TC-0503-93. United States. doi:10.2172/1430945.
Kania, Don, Kyser, David, Meisburger, W. D., Suzuki, Hiroshi, Bruning, John H., and Economou, Nicholas P. Tue . "Development of Critical Technologies of Soft X-Ray Lithography Final Report CRADA No. TC-0503-93". United States. doi:10.2172/1430945. https://www.osti.gov/servlets/purl/1430945.
@article{osti_1430945,
title = {Development of Critical Technologies of Soft X-Ray Lithography Final Report CRADA No. TC-0503-93},
author = {Kania, Don and Kyser, David and Meisburger, W. D. and Suzuki, Hiroshi and Bruning, John H. and Economou, Nicholas P.},
abstractNote = {The project is a relationship between the Lawrence Livermore National Laboratory (LLITL) and Advanced Micro Devices, Incorporated, KLA Instruments Corporation, Hoya Corporation USA, GCA Tropel, and Micrion Corporation.},
doi = {10.2172/1430945},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Mar 13 00:00:00 EDT 2018},
month = {Tue Mar 13 00:00:00 EDT 2018}
}

Technical Report:

Save / Share: