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Title: Computer-aided Design of Plasma Processing Reactors Final Report CRADA No. TC-0339-92

Abstract

The purpose of this project is to develop and validate a comprehensive computer simulation of plasma processing reactors that will form the basis fora computer-aided design tool that will accelerate the desi~, selection and use of dry etching equipment by semiconductor manufacturers. Within the three year period of this agreement, the partners will gather, extend and evaluate the knowledge base and the computer modules required in a computer-aided design tool for plasma etching. They will demonstrate the value of such a simulation tool in the optimization of both the equipment and process for critical etch steps. The project will also provide the foundation for the development of an expert system for use by U.S. semiconductor equipment manufacturers and their customers.

Authors:
 [1];  [2];  [3]
  1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
  2. Bell Lab., Murray Hill, NJ (United States)
  3. IBM, Yorktown Heights, NY (United States). Thomas J. Watson Research Center
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1430933
Report Number(s):
LLNL-TR-747901
DOE Contract Number:  
AC52-07NA27344
Resource Type:
Technical Report
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 97 MATHEMATICS AND COMPUTING

Citation Formats

Vitello, P., Lee, J. T., and Surrendra, M. Computer-aided Design of Plasma Processing Reactors Final Report CRADA No. TC-0339-92. United States: N. p., 2018. Web. doi:10.2172/1430933.
Vitello, P., Lee, J. T., & Surrendra, M. Computer-aided Design of Plasma Processing Reactors Final Report CRADA No. TC-0339-92. United States. doi:10.2172/1430933.
Vitello, P., Lee, J. T., and Surrendra, M. Tue . "Computer-aided Design of Plasma Processing Reactors Final Report CRADA No. TC-0339-92". United States. doi:10.2172/1430933. https://www.osti.gov/servlets/purl/1430933.
@article{osti_1430933,
title = {Computer-aided Design of Plasma Processing Reactors Final Report CRADA No. TC-0339-92},
author = {Vitello, P. and Lee, J. T. and Surrendra, M.},
abstractNote = {The purpose of this project is to develop and validate a comprehensive computer simulation of plasma processing reactors that will form the basis fora computer-aided design tool that will accelerate the desi~, selection and use of dry etching equipment by semiconductor manufacturers. Within the three year period of this agreement, the partners will gather, extend and evaluate the knowledge base and the computer modules required in a computer-aided design tool for plasma etching. They will demonstrate the value of such a simulation tool in the optimization of both the equipment and process for critical etch steps. The project will also provide the foundation for the development of an expert system for use by U.S. semiconductor equipment manufacturers and their customers.},
doi = {10.2172/1430933},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Mar 13 00:00:00 EDT 2018},
month = {Tue Mar 13 00:00:00 EDT 2018}
}

Technical Report:

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