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Title: Controlling phase separation in vanadium dioxide thin films via substrate engineering

Journal Article · · Physical Review B
 [1];  [2];  [1];  [3];  [4];  [4];  [1];  [5];  [5];  [6];  [3];  [7];  [4];  [8];  [1]
  1. Stony Brook Univ., NY (United States). Dept. of Physics
  2. Chinese Academy of Sciences (CAS), Shanghai (China). Shanghai Inst. of Microsystem and Information Technology. State Key Lab. of Transducer Technology
  3. Univ. of Virginia, Charlottesville, VA (United States). Dept. of Materials Science and Engineering
  4. Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
  5. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS)
  6. Brookhaven National Lab. (BNL), Upton, NY (United States). National Synchrotron Light Source II (NSLS-II)
  7. Univ. of Virginia, Charlottesville, VA (United States). Dept. of Materials Science and Engineering, and Dept. of Physics
  8. Chinese Academy of Sciences (CAS), Shanghai (China). Shanghai Inst. of Microsystem and Information Technology. State Key Lab. of Transducer Technology; Univ. of Texas, Austin, TX (United States). Dept. of Mechanical Engineering

© 2017 American Physical Society. The strong electron-lattice interactions in correlated electron systems provide unique opportunities for altering the material properties with relative ease and flexibility. In this Rapid Communication, we use localized strain control via a focused-ion-beam patterning of TiO2 substrates to demonstrate that one can selectively engineer the insulator-to-metal transition temperature, the fractional component of the insulating and metallic phases, and the degree of optical anisotropy down to the length scales of the intrinsic phase separation in VO2 thin films without altering the quality of the films. The effects of localized strain control on the strongly correlated electron system are directly visualized by state-of-the-art IR near-field imaging and spectroscopy techniques and x-ray microdiffraction measurements.

Research Organization:
Argonne National Laboratory (ANL), Argonne, IL (United States); Brookhaven National Laboratory (BNL), Upton, NY (United States); Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
National Science Foundation (NSF); USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities Division
Grant/Contract Number:
AC02-06CH11357; SC0012704; SC0012509; AC02-05CH11231
OSTI ID:
1423692
Alternate ID(s):
OSTI ID: 1402110; OSTI ID: 1426462; OSTI ID: 1526496
Report Number(s):
BNL-203352-2018-JAAM; PRBMDO; 140009; TRN: US1801832
Journal Information:
Physical Review B, Vol. 96, Issue 16; ISSN 2469-9950
Publisher:
American Physical Society (APS)Copyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 11 works
Citation information provided by
Web of Science

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Cited By (5)

Modern Scattering‐Type Scanning Near‐Field Optical Microscopy for Advanced Material Research journal April 2019
Nanoimaging and Nanospectroscopy of Polaritons with Time Resolved s ‐SNOM journal September 2019
Thickness effects on the epitaxial strain states and phase transformations in (001)-VO 2 /TiO 2 thin films journal February 2019
Photo-induced charge density distribution in metal surfaces and its extraction with apertureless near-field optics journal April 2019
Investigating Metal–Insulator Transition and Structural Phase Transformation in the (010)-VO2/(001)-YSZ Epitaxial Thin Films journal September 2018

Figures / Tables (4)