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Title: Extreme Ultra Violet Lithography (EUVL) Final Report CRADA No. TC-1363-96

Abstract

This CRADA was a short-term transition CRADA which allowed the continued development of EUVL technology while a coordinated multi-lab/industry agreement was worked out.

Authors:
 [1];  [2]
  1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
  2. Intel Corp., Santa Clara, CA (United States)
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1426117
Report Number(s):
LLNL-TR-747071
DOE Contract Number:  
AC52-07NA27344
Resource Type:
Technical Report
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION; 36 MATERIALS SCIENCE

Citation Formats

Lindquist, W., and Chou, S. Extreme Ultra Violet Lithography (EUVL) Final Report CRADA No. TC-1363-96. United States: N. p., 2018. Web. doi:10.2172/1426117.
Lindquist, W., & Chou, S. Extreme Ultra Violet Lithography (EUVL) Final Report CRADA No. TC-1363-96. United States. doi:10.2172/1426117.
Lindquist, W., and Chou, S. Thu . "Extreme Ultra Violet Lithography (EUVL) Final Report CRADA No. TC-1363-96". United States. doi:10.2172/1426117. https://www.osti.gov/servlets/purl/1426117.
@article{osti_1426117,
title = {Extreme Ultra Violet Lithography (EUVL) Final Report CRADA No. TC-1363-96},
author = {Lindquist, W. and Chou, S.},
abstractNote = {This CRADA was a short-term transition CRADA which allowed the continued development of EUVL technology while a coordinated multi-lab/industry agreement was worked out.},
doi = {10.2172/1426117},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2018},
month = {3}
}

Technical Report:

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