Evolution of arsenic in high fluence plasma immersion ion implanted silicon: Behavior of the as-implanted surface

Vishwanath, V.; Demenev, E.; Giubertoni, D.; Vanzetti, L.; Koh, A. L.; Steinhauser, G.; Pepponi, G.; Bersani, M.; Meirer, F.; Foad, M. A.

doi:10.1016/j.apsusc.2015.07.068

Title: Evolution of arsenic in high fluence plasma immersion ion implanted silicon: Behavior of the as-implanted surface

Journal Article · Sun Nov 01 00:00:00 EDT 2015 · Applied Surface Science

DOI:https://doi.org/10.1016/j.apsusc.2015.07.068· OSTI ID:1422680

Vishwanath, V.; Demenev, E.; Giubertoni, D.; Vanzetti, L.; Koh, A. L.; Steinhauser, G.; Pepponi, G.; Bersani, M.; Meirer, F.; Foad, M. A.

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Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

OSTI ID:: 1422680

Journal Information:: Applied Surface Science, Journal Name: Applied Surface Science Vol. 355 Journal Issue: C; ISSN 0169-4332

Publisher:: ElsevierCopyright Statement

Country of Publication:: Netherlands

Language:: English

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Cited by: 2 works

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References (23)

Redistribution of arsenic in silicon during high pressure thermal oxidation Choi, Seong S.; Numan, M. Z.; Chu, W. K. Applied Physics Letters, Vol. 50, Issue 11 https://doi.org/10.1063/1.98067	journal	March 1987
Cleaner production in the Solvay Process: general strategies and recent developments Steinhauser, Georg Journal of Cleaner Production, Vol. 16, Issue 7 https://doi.org/10.1016/j.jclepro.2007.04.005	journal	May 2008
Conformal doping mechanism for fin field effect transistors by self-regulatory plasma doping with AsH ₃ plasma diluted with He Sasaki, Yuichiro; Okashita, Katsumi; Mizuo, Bunji Journal of Applied Physics, Vol. 111, Issue 1 https://doi.org/10.1063/1.3676579	journal	January 2012
Direct Measurements of Self-Sputtering, Swelling, and Deposition Effects of N-Type Low-Energy Ion Implantations Qin, Shu; Zhuang, Kent; Hu, Yongjun Jeff IEEE Transactions on Plasma Science https://doi.org/10.1109/TPS.2009.2029111	journal	September 2009
Anomalous behavior of shallow BF3 plasma immersion ion implantation Jones, Erin C. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 12, Issue 2 https://doi.org/10.1116/1.587335	journal	March 1994
Spontaneous growth of arsenic oxide micro-crystals on chemically etched MnAs surfaces Takagaki, Y.; Wiebicke, E.; Ramsteiner, M. Applied Physics A: Materials Science & Processing, Vol. 76, Issue 5 https://doi.org/10.1007/s00339-002-2068-2	journal	March 2003
Anomalous oxidation rate of silicon implanted with very high doses of arsenic Choi, Seong S.; Numan, M. Z.; Chu, W. K. Applied Physics Letters, Vol. 51, Issue 13 https://doi.org/10.1063/1.98812	journal	September 1987
Effects of Plasma Irradiation in Arsenic Plasma Doping Using Overhang Test Structures Kubota, Masafumi; Hayashi, Shigenori; Ogura, Mototsugu Japanese Journal of Applied Physics, Vol. 52, Issue 2R https://doi.org/10.7567/JJAP.52.021301	journal	February 2013
Raman spectroscopy of arsenolite: crystalline cubic As4O6 Gilliam, Sean J.; Merrow, Clifton N.; Kirkby, Scott J. Journal of Solid State Chemistry, Vol. 173, Issue 1 https://doi.org/10.1016/S0022-4596(03)00082-3	journal	June 2003
Oxide Growth Enhancement on Highly n‐Type Doped Silicon under Steam Oxidation Biermann, Erich; Berger, Horst H.; Linke, Peter Journal of The Electrochemical Society, Vol. 143, Issue 4 https://doi.org/10.1149/1.1836656	journal	April 1996
Correlation of local structure and electrical activation in arsenic ultrashallow junctions in silicon Giubertoni, Damiano; Pepponi, Giancarlo; Gennaro, Salvatore Journal of Applied Physics, Vol. 104, Issue 10 https://doi.org/10.1063/1.3026706	journal	November 2008
Surface evolution of very high dose arsenic implants in silicon formed by plasma immersion ion implantation - a long term study: Surface evolution of very high dose arsenic implants in silicon formed by plasma immersion ion implantation - a long term study Meirer, Florian; Demenev, Evgeny; Giubertoni, Damiano physica status solidi (c), Vol. 11, Issue 1 https://doi.org/10.1002/pssc.201300160	journal	December 2013
Formation of arsenolite crystals at room temperature after very high dose arsenic implantation in silicon Meirer, Florian; Giubertoni, Damiano; Demenev, Evgeny Applied Physics Letters, Vol. 101, Issue 23 https://doi.org/10.1063/1.4769446	journal	December 2012
Formation of arsenic rich silicon oxide under plasma immersion ion implantation and laser annealing Meirer, F.; Demenev, E.; Giubertoni, D. ION IMPLANTATION TECHNOLOGY 2012: Proceedings of the 19th International Conference on Ion Implantation Technology, AIP Conference Proceedings https://doi.org/10.1063/1.4766520	conference	January 2012
Arsenic incorporation in native oxides of GaAs grown thermally under arsenic trioxide vapor Schwartz, G. P.; Griffiths, J. E.; DiStefano, D. Applied Physics Letters, Vol. 34, Issue 11 https://doi.org/10.1063/1.90656	journal	June 1979
Plasma doping for the fabrication of ultra-shallow junctions Felch, S. B.; Fang, Z.; Koo, B. -W Surface and Coatings Technology, Vol. 156, Issue 1-3 https://doi.org/10.1016/S0257-8972(02)00097-X	journal	July 2002
Damage accumulation and dopant migration during shallow As and Sb implantation into Si Werner, M.; Vandenberg, J.; Armour, D. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Vol. 216 https://doi.org/10.1016/j.nimb.2003.11.022	journal	February 2004
Ultrathin SiO2 on Si II. Issues in quantification of the oxide thickness Seah, M. P.; Spencer, S. J. Surface and Interface Analysis, Vol. 33, Issue 8 https://doi.org/10.1002/sia.1433	journal	January 2002
Calibration correction of ultra low energy SIMS profiles based on MEIS analyses for arsenic shallow implants in silicon Demenev, E.; Giubertoni, D.; van den Berg, J. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Vol. 273 https://doi.org/10.1016/j.nimb.2011.07.073	journal	February 2012
Thermal Oxidation of Arsenic‐Diffused Silicon Ohkawa, Shinji; Nakajima, Yoshio Journal of The Electrochemical Society, Vol. 125, Issue 12 https://doi.org/10.1149/1.2131350	journal	December 1978
Three-dimensional doping and diffusion in nano scaled devices as studied by atom probe tomography Kambham, Ajay Kumar; Kumar, Arul; Florakis, Antonios Nanotechnology, Vol. 24, Issue 27 https://doi.org/10.1088/0957-4484/24/27/275705	journal	June 2013
Expanding the menu for carnivorous plants: Uptake of potassium, iron and manganese by carnivorous pitcher plants Adlassnig, Wolfram; Steinhauser, Georg; Peroutka, Marianne Applied Radiation and Isotopes, Vol. 67, Issue 12 https://doi.org/10.1016/j.apradiso.2009.04.006	journal	December 2009
X–ray absorption fine structure (XAFS) of Si wafer measured using total reflection X–rays Kawai, Jun; Hayakawa, Shinjiro; Kitajima, Yoshinori Spectrochimica Acta Part B: Atomic Spectroscopy, Vol. 54, Issue 1 https://doi.org/10.1016/S0584-8547(98)00209-2	journal	January 1999

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