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Title: Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods

Authors:
 [1];  [2];  [3];  [4];  [5];  [6];  [2];  [7]
  1. Physics Department, Illinois Institute of Technology, Chicago, Illinois 60616
  2. Lawrence Berkley National Laboratory, Berkley, California 94720
  3. European Synchrotron Radiation Facility, Grenoble 38000, France
  4. GSECARS, University of Chicago, Argonne, Illinois 60439
  5. X-Ray Science Department, Advanced Photon Source, Argonne National Laboratory, Lemont, Illinois 60439
  6. Material Science Division, Argonne National Laboratory, Argonne, Illinois 60439
  7. Commissariat de l'énergie atomique, Centre de Saclay, Gif-sur-Yvette 91191, France
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1422434
Grant/Contract Number:
AC02-05CH11231; AC02-06CH11357; FWP50335
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 36; Journal Issue: 2; Related Information: CHORUS Timestamp: 2018-02-23 09:47:55; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Country of Publication:
United States
Language:
English

Citation Formats

Becker, Nicholas G., Butterworth, Anna L., Salome, Murielle, Sutton, Stephen R., De Andrade, Vincent, Sokolov, Andrey, Westphal, Andrew J., and Proslier, Thomas. Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods. United States: N. p., 2018. Web. doi:10.1116/1.5025240.
Becker, Nicholas G., Butterworth, Anna L., Salome, Murielle, Sutton, Stephen R., De Andrade, Vincent, Sokolov, Andrey, Westphal, Andrew J., & Proslier, Thomas. Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods. United States. doi:10.1116/1.5025240.
Becker, Nicholas G., Butterworth, Anna L., Salome, Murielle, Sutton, Stephen R., De Andrade, Vincent, Sokolov, Andrey, Westphal, Andrew J., and Proslier, Thomas. Thu . "Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods". United States. doi:10.1116/1.5025240.
@article{osti_1422434,
title = {Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods},
author = {Becker, Nicholas G. and Butterworth, Anna L. and Salome, Murielle and Sutton, Stephen R. and De Andrade, Vincent and Sokolov, Andrey and Westphal, Andrew J. and Proslier, Thomas},
abstractNote = {},
doi = {10.1116/1.5025240},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
number = 2,
volume = 36,
place = {United States},
year = {Thu Mar 01 00:00:00 EST 2018},
month = {Thu Mar 01 00:00:00 EST 2018}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on February 23, 2019
Publisher's Accepted Manuscript

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