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Title: Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography

Authors:
 [1]; ORCiD logo [1]
  1. Department of Materials Science and Engineering, Frederick Seitz Materials Research Laboratory, and Beckman Institute for Advanced Science and Technology, University of Illinois at Urbana-Champaign, Urbana IL 61801 USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1422426
Grant/Contract Number:
SC0001293
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Advanced Optical Materials
Additional Journal Information:
Journal Volume: 6; Journal Issue: 8; Related Information: CHORUS Timestamp: 2018-04-18 08:06:09; Journal ID: ISSN 2195-1071
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Bacon-Brown, Daniel A., and Braun, Paul V. Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography. Germany: N. p., 2018. Web. doi:10.1002/adom.201701049.
Bacon-Brown, Daniel A., & Braun, Paul V. Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography. Germany. doi:10.1002/adom.201701049.
Bacon-Brown, Daniel A., and Braun, Paul V. Fri . "Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography". Germany. doi:10.1002/adom.201701049.
@article{osti_1422426,
title = {Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography},
author = {Bacon-Brown, Daniel A. and Braun, Paul V.},
abstractNote = {},
doi = {10.1002/adom.201701049},
journal = {Advanced Optical Materials},
number = 8,
volume = 6,
place = {Germany},
year = {Fri Feb 23 00:00:00 EST 2018},
month = {Fri Feb 23 00:00:00 EST 2018}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on February 23, 2019
Publisher's Accepted Manuscript

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