Activation of the dimers and tetramers of metal amidinate atomic layer deposition precursors upon adsorption on silicon oxide surfaces

Chen, Bo; Duan, Yichen; Yao, Yunxi; Ma, Qiang; Coyle, Jason P.; Barry, Seán T.; Teplyakov, Andrew V.; Zaera, Francisco

doi:10.1116/1.4971990

Title: Activation of the dimers and tetramers of metal amidinate atomic layer deposition precursors upon adsorption on silicon oxide surfaces

Journal Article · Sun Jan 01 00:00:00 EST 2017 · Journal of Vacuum Science and Technology A

DOI:https://doi.org/10.1116/1.4971990· OSTI ID:1421264

Chen, Bo ^[1]; Duan, Yichen ^[2]; Yao, Yunxi; Ma, Qiang; Coyle, Jason P.; Barry, Seán T.; Teplyakov, Andrew V. ^[2]; Zaera, Francisco ^[1]

Department of Chemistry, University of California, Riverside, California 92521
Department of Chemistry and Biochemistry, University of Delaware, Newark, Delaware 19716

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Sponsoring Organization:: USDOE

Grant/Contract Number:: FG02-03ER46599; SC0001839

OSTI ID:: 1421264

Journal Information:: Journal of Vacuum Science and Technology A, Journal Name: Journal of Vacuum Science and Technology A Vol. 35 Journal Issue: 1; ISSN 0734-2101

Publisher:: American Vacuum SocietyCopyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 13 works

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