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Title: Superlubricating graphene and graphene oxide films

Abstract

A system and method for forming at least one of graphene and graphene oxide on a substrate and an opposed wear member. The system includes graphene and graphene oxide formed by an exfoliation process or solution processing method to dispose graphene and/or graphene oxide onto a substrate. The system further includes an opposing wear member disposed on another substrate and a gas atmosphere of an inert gas like N2, ambient, a humid atmosphere and a water solution.

Inventors:
; ; ;
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1420836
Patent Number(s):
9,890,345
Application Number:
14/415,499
Assignee:
UChicago Argonne, LLC (Chicago, IL) ANL
DOE Contract Number:
AC02-06CH11357
Resource Type:
Patent
Resource Relation:
Patent File Date: 2013 Jul 18
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Sumant, Anirudha V., Erdemir, Ali, Choi, Junho, and Berman, Diana. Superlubricating graphene and graphene oxide films. United States: N. p., 2018. Web.
Sumant, Anirudha V., Erdemir, Ali, Choi, Junho, & Berman, Diana. Superlubricating graphene and graphene oxide films. United States.
Sumant, Anirudha V., Erdemir, Ali, Choi, Junho, and Berman, Diana. Tue . "Superlubricating graphene and graphene oxide films". United States. doi:. https://www.osti.gov/servlets/purl/1420836.
@article{osti_1420836,
title = {Superlubricating graphene and graphene oxide films},
author = {Sumant, Anirudha V. and Erdemir, Ali and Choi, Junho and Berman, Diana},
abstractNote = {A system and method for forming at least one of graphene and graphene oxide on a substrate and an opposed wear member. The system includes graphene and graphene oxide formed by an exfoliation process or solution processing method to dispose graphene and/or graphene oxide onto a substrate. The system further includes an opposing wear member disposed on another substrate and a gas atmosphere of an inert gas like N2, ambient, a humid atmosphere and a water solution.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Feb 13 00:00:00 EST 2018},
month = {Tue Feb 13 00:00:00 EST 2018}
}

Patent:

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