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Title: Review Article: Reactions of fluorine atoms with silicon, revisited, again

Journal Article · · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
DOI:https://doi.org/10.1116/1.4983922· OSTI ID:1361942
 [1]
  1. Department of Chemical and Biomolecular Engineering, University of Houston, Engineering Bldg. D, 4800 Calhoun Rd., Houston, Texas 77204

Sponsoring Organization:
USDOE
Grant/Contract Number:
SC0001319; DESC0001319
OSTI ID:
1361942
Alternate ID(s):
OSTI ID: 1420717
Journal Information:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films Vol. 35 Journal Issue: 5; ISSN 0734-2101
Publisher:
American Vacuum SocietyCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 27 works
Citation information provided by
Web of Science