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Title: Insights to scaling remote plasma sources sustained in NF 3 mixtures

Authors:
 [1];  [2];  [3];  [2];  [2];  [2];  [3];  [1]
  1. Department of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Ave., Ann Arbor, Michigan 48109-2122
  2. Samsung Electronics Co., Ltd., 129 Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do 443-742, South Korea
  3. Department of Physics and Astronomy, University College London, London WC1E 6BT, United Kingdom
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1420694
Grant/Contract Number:  
SC0001319; SC0014132
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 35; Journal Issue: 3; Related Information: CHORUS Timestamp: 2018-02-14 18:57:24; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Country of Publication:
United States
Language:
English

Citation Formats

Huang, Shuo, Volynets, Vladimir, Hamilton, James R., Lee, Sangheon, Song, In-Cheol, Lu, Siqing, Tennyson, Jonathan, and Kushner, Mark J. Insights to scaling remote plasma sources sustained in NF 3 mixtures. United States: N. p., 2017. Web. doi:10.1116/1.4978551.
Huang, Shuo, Volynets, Vladimir, Hamilton, James R., Lee, Sangheon, Song, In-Cheol, Lu, Siqing, Tennyson, Jonathan, & Kushner, Mark J. Insights to scaling remote plasma sources sustained in NF 3 mixtures. United States. doi:10.1116/1.4978551.
Huang, Shuo, Volynets, Vladimir, Hamilton, James R., Lee, Sangheon, Song, In-Cheol, Lu, Siqing, Tennyson, Jonathan, and Kushner, Mark J. Mon . "Insights to scaling remote plasma sources sustained in NF 3 mixtures". United States. doi:10.1116/1.4978551.
@article{osti_1420694,
title = {Insights to scaling remote plasma sources sustained in NF 3 mixtures},
author = {Huang, Shuo and Volynets, Vladimir and Hamilton, James R. and Lee, Sangheon and Song, In-Cheol and Lu, Siqing and Tennyson, Jonathan and Kushner, Mark J.},
abstractNote = {},
doi = {10.1116/1.4978551},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
number = 3,
volume = 35,
place = {United States},
year = {Mon May 01 00:00:00 EDT 2017},
month = {Mon May 01 00:00:00 EDT 2017}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record at 10.1116/1.4978551

Citation Metrics:
Cited by: 4 works
Citation information provided by
Web of Science

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