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Title: Correlated high-resolution x-ray diffraction photoluminescence and atom probe tomography analysis of continuous and discontinuous InxGa1-xN quantum wells

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4926808· OSTI ID:1235287
 [1];  [1];  [2];  [1]
  1. Northwestern Univ., Evanston, IL (United States)
  2. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)

In this study, atom probe tomography (APT) is used to characterize the influence of hydrogen dosing duringGaN barrier growth on the indium distribution of InxGa1-xN quantum wells, and correlatedmicro-photoluminescence is used to measure changes in the emission spectrum and efficiency. We found that relative to the control growth, hydrogen dosing leads to a 50% increase in emission intensity arising from discontinuous quantum wells that are narrower, of lower indium content, and with more abrupt interfaces. Additionally, simulations of carrier distributions based on APT composition profiles indicate that the greater carrier confinement leads to an increased radiative recombination rate. Furthermore, APT analysis of quantum well profiles enables refinement of x-ray diffractionanalysis for more accurate nondestructive measurements of composition.

Research Organization:
Energy Frontier Research Centers (EFRC) (United States). EFRC for Solid State Lighting Science (SSLS); Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA)
Grant/Contract Number:
AC04-94AL85000
OSTI ID:
1235287
Alternate ID(s):
OSTI ID: 1420582
Report Number(s):
SAND-2015-5515J; 594846
Journal Information:
Applied Physics Letters, Vol. 107, Issue 02; ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 10 works
Citation information provided by
Web of Science

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Cited By (2)