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Title: Impact of deposition rate, underlayers, and substrates on β-tungsten formation in sputter deposited films

Journal Article · · Journal of Vacuum Science and Technology A
DOI:https://doi.org/10.1116/1.5003628· OSTI ID:1420471
 [1];  [1]
  1. Department of Applied Physics and Applied Mathematics, Columbia University, New York, New York 10027

Sponsoring Organization:
USDOE
Grant/Contract Number:
SC0012704
OSTI ID:
1420471
Journal Information:
Journal of Vacuum Science and Technology A, Journal Name: Journal of Vacuum Science and Technology A Vol. 35 Journal Issue: 6; ISSN 0734-2101
Publisher:
American Vacuum SocietyCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 9 works
Citation information provided by
Web of Science

References (18)

Microstructure, growth, resistivity, and stresses in thin tungsten films deposited by rf sputtering journal June 1973
Current-induced spin orientation of electrons in semiconductors journal July 1971
Sputter-deposited amorphous-like tungsten journal March 2004
Phase, grain structure, stress, and resistivity of sputter-deposited tungsten films journal September 2011
Structure and stability of sputter deposited beta‐tungsten thin films journal June 1994
Topologically close-packed phases: Deposition and formation mechanism of metastable β-W in thin films journal February 2016
Growth and characterization of α and β -phase tungsten films on various substrates
  • Lee, Jeong-Seop; Cho, Jaehun; You, Chun-Yeol
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 34, Issue 2 https://doi.org/10.1116/1.4936261
journal March 2016
Beta (β) tungsten thin films: Structure, electron transport, and giant spin Hall effect journal May 2015
Spin transfer torque devices utilizing the giant spin Hall effect of tungsten journal September 2012
Structure and morphological study of nanometer W and W3O thin films journal March 2003
XRD line profile analysis of tungsten thin films journal October 2005
Influence of microstructure on residual stress in tungsten thin films analyzed by X-ray diffraction journal April 1996
Phase transformation of thin sputter-deposited tungsten films at room temperature
  • Rossnagel, S. M.; Noyan, I. C.; Cabral, C.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 20, Issue 5 https://doi.org/10.1116/1.1506905
journal January 2002
Transformation of topologically close-packed β-W to body-centered cubic α-W: Comparison of experiments and computations journal October 2017
β-phase tungsten nanorod formation by oblique-angle sputter deposition journal October 2003
Inhomogeneous strain states in sputter deposited tungsten thin films journal November 1997
Stresses in sputtered tungsten thin films journal September 1989
Annealing effects on the structural and electrical properties of sputtered tungsten thin films journal November 2016

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