Impact of deposition rate, underlayers, and substrates on β-tungsten formation in sputter deposited films
Journal Article
·
· Journal of Vacuum Science and Technology A
- Department of Applied Physics and Applied Mathematics, Columbia University, New York, New York 10027
- Sponsoring Organization:
- USDOE
- Grant/Contract Number:
- SC0012704
- OSTI ID:
- 1420471
- Journal Information:
- Journal of Vacuum Science and Technology A, Journal Name: Journal of Vacuum Science and Technology A Vol. 35 Journal Issue: 6; ISSN 0734-2101
- Publisher:
- American Vacuum SocietyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 9 works
Citation information provided by
Web of Science
Web of Science
Similar Records
A solar-blind photodetector based on β-Ga2O3 film deposited on MgO (100) substrates by RF magnetron sputtering
Impact of the surface-near silicon substrate properties on the microstructure of sputter-deposited AlN thin films
Study of Ni{sub 2}-Mn-Ga phase formation by magnetron sputtering film deposition at low temperature onto Si substrates and LaNiO{sub 3}/Pb(Ti,Zr)O{sub 3} buffer
Journal Article
·
Thu Oct 01 00:00:00 EDT 2020
· Vacuum
·
OSTI ID:1420471
+5 more
Impact of the surface-near silicon substrate properties on the microstructure of sputter-deposited AlN thin films
Journal Article
·
Mon Nov 26 00:00:00 EST 2012
· Applied Physics Letters
·
OSTI ID:1420471
+3 more
Study of Ni{sub 2}-Mn-Ga phase formation by magnetron sputtering film deposition at low temperature onto Si substrates and LaNiO{sub 3}/Pb(Ti,Zr)O{sub 3} buffer
Journal Article
·
Fri Jan 15 00:00:00 EST 2010
· Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
·
OSTI ID:1420471
+8 more