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Title: Multiscale modeling of shock wave localization in porous energetic material

Authors:
; ; ;
Publication Date:
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1418718
Grant/Contract Number:
NA0003525
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Physical Review B
Additional Journal Information:
Journal Volume: 97; Journal Issue: 1; Related Information: CHORUS Timestamp: 2018-01-30 10:44:59; Journal ID: ISSN 2469-9950
Publisher:
American Physical Society
Country of Publication:
United States
Language:
English

Citation Formats

Wood, M. A., Kittell, D. E., Yarrington, C. D., and Thompson, A. P.. Multiscale modeling of shock wave localization in porous energetic material. United States: N. p., 2018. Web. doi:10.1103/PhysRevB.97.014109.
Wood, M. A., Kittell, D. E., Yarrington, C. D., & Thompson, A. P.. Multiscale modeling of shock wave localization in porous energetic material. United States. doi:10.1103/PhysRevB.97.014109.
Wood, M. A., Kittell, D. E., Yarrington, C. D., and Thompson, A. P.. 2018. "Multiscale modeling of shock wave localization in porous energetic material". United States. doi:10.1103/PhysRevB.97.014109.
@article{osti_1418718,
title = {Multiscale modeling of shock wave localization in porous energetic material},
author = {Wood, M. A. and Kittell, D. E. and Yarrington, C. D. and Thompson, A. P.},
abstractNote = {},
doi = {10.1103/PhysRevB.97.014109},
journal = {Physical Review B},
number = 1,
volume = 97,
place = {United States},
year = 2018,
month = 1
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on January 30, 2019
Publisher's Accepted Manuscript

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  • Nanoporous silicon films on a silicon wafer were loaded with sodium perchlorate and initiated using illumination with infrared laser pulses to cause laser thermal ignition and laser-generated shock waves. Using Photon Doppler Velocimetry, it was determined that these waves are weak stress waves with a threshold intensity of 131 MPa in the silicon substrate. Shock generation was achieved through confinement of a plasma, generated upon irradiation of an absorptive paint layer held against the substrate side of the wafer. These stress waves were below the threshold required for sample fracturing. Exploiting either the laser thermal or laser-generated shock mechanisms of ignitionmore » may permit use of pSi energetic materials in applications otherwise precluded due to their environmental sensitivity.« less