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Title: Method and system for gas flow mitigation of molecular contamination of optics

Abstract

A computer-implemented method for determining an optimized purge gas flow in a semi-conductor inspection metrology or lithography apparatus, comprising receiving a permissible contaminant mole fraction, a contaminant outgassing flow rate associated with a contaminant, a contaminant mass diffusivity, an outgassing surface length, a pressure, a temperature, a channel height, and a molecular weight of a purge gas, calculating a flow factor based on the permissible contaminant mole fraction, the contaminant outgassing flow rate, the channel height, and the outgassing surface length, comparing the flow factor to a predefined maximum flow factor value, calculating a minimum purge gas velocity and a purge gas mass flow rate from the flow factor, the contaminant mass diffusivity, the pressure, the temperature, and the molecular weight of the purge gas, and introducing the purge gas into the semi-conductor inspection metrology or lithography apparatus with the minimum purge gas velocity and the purge gas flow rate.

Inventors:
; ; ; ; ; ; ;
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1417885
Patent Number(s):
9,874,512
Application Number:
14/466,516
Assignee:
National Technology & Engineering Solutions of Sandia, LLC (Albuquerque, NM) SNL-A
DOE Contract Number:
AC04-94AL85000
Resource Type:
Patent
Resource Relation:
Patent File Date: 2014 Aug 22
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING

Citation Formats

Delgado, Gildardo, Johnson, Terry, Arienti, Marco, Harb, Salam, Klebanoff, Lennie, Garcia, Rudy, Tahmassebpur, Mohammed, and Scott, Sarah. Method and system for gas flow mitigation of molecular contamination of optics. United States: N. p., 2018. Web.
Delgado, Gildardo, Johnson, Terry, Arienti, Marco, Harb, Salam, Klebanoff, Lennie, Garcia, Rudy, Tahmassebpur, Mohammed, & Scott, Sarah. Method and system for gas flow mitigation of molecular contamination of optics. United States.
Delgado, Gildardo, Johnson, Terry, Arienti, Marco, Harb, Salam, Klebanoff, Lennie, Garcia, Rudy, Tahmassebpur, Mohammed, and Scott, Sarah. Tue . "Method and system for gas flow mitigation of molecular contamination of optics". United States. doi:. https://www.osti.gov/servlets/purl/1417885.
@article{osti_1417885,
title = {Method and system for gas flow mitigation of molecular contamination of optics},
author = {Delgado, Gildardo and Johnson, Terry and Arienti, Marco and Harb, Salam and Klebanoff, Lennie and Garcia, Rudy and Tahmassebpur, Mohammed and Scott, Sarah},
abstractNote = {A computer-implemented method for determining an optimized purge gas flow in a semi-conductor inspection metrology or lithography apparatus, comprising receiving a permissible contaminant mole fraction, a contaminant outgassing flow rate associated with a contaminant, a contaminant mass diffusivity, an outgassing surface length, a pressure, a temperature, a channel height, and a molecular weight of a purge gas, calculating a flow factor based on the permissible contaminant mole fraction, the contaminant outgassing flow rate, the channel height, and the outgassing surface length, comparing the flow factor to a predefined maximum flow factor value, calculating a minimum purge gas velocity and a purge gas mass flow rate from the flow factor, the contaminant mass diffusivity, the pressure, the temperature, and the molecular weight of the purge gas, and introducing the purge gas into the semi-conductor inspection metrology or lithography apparatus with the minimum purge gas velocity and the purge gas flow rate.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 23 00:00:00 EST 2018},
month = {Tue Jan 23 00:00:00 EST 2018}
}

Patent:

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