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Title: Mechanism of Na accumulation at extended defects in Si from first-principles

 [1];  [1]
  1. Center for Nanoscale Materials, Argonne National Laboratory, Lemont, Illinois 60439, USA
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Sponsoring Org.:
OSTI Identifier:
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Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 123; Journal Issue: 16; Related Information: CHORUS Timestamp: 2018-01-10 11:51:50; Journal ID: ISSN 0021-8979
American Institute of Physics
Country of Publication:
United States

Citation Formats

Park, Ji-Sang, and Chan, Maria K. Y. Mechanism of Na accumulation at extended defects in Si from first-principles. United States: N. p., 2018. Web. doi:10.1063/1.5003385.
Park, Ji-Sang, & Chan, Maria K. Y. Mechanism of Na accumulation at extended defects in Si from first-principles. United States. doi:10.1063/1.5003385.
Park, Ji-Sang, and Chan, Maria K. Y. 2018. "Mechanism of Na accumulation at extended defects in Si from first-principles". United States. doi:10.1063/1.5003385.
title = {Mechanism of Na accumulation at extended defects in Si from first-principles},
author = {Park, Ji-Sang and Chan, Maria K. Y.},
abstractNote = {},
doi = {10.1063/1.5003385},
journal = {Journal of Applied Physics},
number = 16,
volume = 123,
place = {United States},
year = 2018,
month = 4

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on January 10, 2019
Publisher's Accepted Manuscript

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