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Title: Nanocrystal thin film fabrication methods and apparatus

Abstract

Nanocrystal thin film devices and methods for fabricating nanocrystal thin film devices are disclosed. The nanocrystal thin films are diffused with a dopant such as Indium, Potassium, Tin, etc. to reduce surface states. The thin film devices may be exposed to air during a portion of the fabrication. This enables fabrication of nanocrystal-based devices using a wider range of techniques such as photolithography and photolithographic patterning in an air environment.

Inventors:
; ; ;
Publication Date:
Research Org.:
The Trustees Of The University Of Pennsylvania, Philadelphia, PA (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22). Materials Sciences & Engineering Division
OSTI Identifier:
1416328
Patent Number(s):
9,865,465
Application Number:
14/761,799
Assignee:
The Trustees Of The University Of Pennsylvania (Philadelphia, PA) CHO
DOE Contract Number:
SC0002158
Resource Type:
Patent
Resource Relation:
Patent File Date: 2014 Jan 17
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Kagan, Cherie R., Kim, David K., Choi, Ji-Hyuk, and Lai, Yuming. Nanocrystal thin film fabrication methods and apparatus. United States: N. p., 2018. Web.
Kagan, Cherie R., Kim, David K., Choi, Ji-Hyuk, & Lai, Yuming. Nanocrystal thin film fabrication methods and apparatus. United States.
Kagan, Cherie R., Kim, David K., Choi, Ji-Hyuk, and Lai, Yuming. Tue . "Nanocrystal thin film fabrication methods and apparatus". United States. doi:. https://www.osti.gov/servlets/purl/1416328.
@article{osti_1416328,
title = {Nanocrystal thin film fabrication methods and apparatus},
author = {Kagan, Cherie R. and Kim, David K. and Choi, Ji-Hyuk and Lai, Yuming},
abstractNote = {Nanocrystal thin film devices and methods for fabricating nanocrystal thin film devices are disclosed. The nanocrystal thin films are diffused with a dopant such as Indium, Potassium, Tin, etc. to reduce surface states. The thin film devices may be exposed to air during a portion of the fabrication. This enables fabrication of nanocrystal-based devices using a wider range of techniques such as photolithography and photolithographic patterning in an air environment.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 09 00:00:00 EST 2018},
month = {Tue Jan 09 00:00:00 EST 2018}
}

Patent:

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